Author: Nada M. AbuhadbaPublisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 0
Book Description
Process Parameter-growth Environment-film Property Relationships for Radio Frequency Reactive Sputter Deposited Vanadium Oxides in Rare Gas/oxygen Discharges
Author: Nada M. AbuhadbaPublisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 0
Book Description
Process Parameter-growth Environment-film Property Relationships for Reactive Sputter Deposited Zirconium-oxygen and Yttrium-oxygen Thin Films
Author: Chee-Kin KwokPublisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 200
Book Description
Dissertation Abstracts International
Author: Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 792
Book Description
Low Temperature Film Growth of the Oxides of Zinc, Aluminum, and Vanadium (and Related Systems, Oxides of Gold and Germanium, Nitrides of Aluminum and Tungsten) by Reactive Sputter Deposition
Author: Carolyn R. AitaPublisher:
ISBN:
Category :
Languages : en
Pages : 140
Book Description
The research involved investigation of process parameter growth environment film property relationships for various binary oxide and nitride films grown on unheated substrates by reactive sputter deposition using an elemental target. In situ optical emission spectroscopy and glow discharge mass spectrometry were used to determine gas phase species in the plasma volume. A battery of techniques were used to characterize (post-deposition) film crystallography, chemistry, microstructure, electrical resistivity, and optical behavior. Keywords: Sputter deposition, Glow discharges, Glow discharge diagnostics, Optical emission, Mass spectrometry, Aluminum oxide, Vanadium, Pentoxide, Gold oxide, Tungsten nitride, Aluminum nitride, Germanium dioxide.
Growth of Radio Frequency Sputter Deposited Vanadium Pentoxide Thin Films on Rough and Smooth Surfaces
Author: Brian K. Blackmon (M.S.)Publisher:
ISBN:
Category : Crystal growth
Languages : en
Pages : 74
Book Description
BTL Talks and Papers
Author: Bell Telephone Laboratories, inc. Technical Information LibrariesPublisher:
ISBN:
Category : Physics
Languages : en
Pages : 622
Book Description
Bell Laboratories Talks and Papers
Author: Bell Telephone Laboratories. Libraries and Information Systems CenterPublisher:
ISBN:
Category : Physics
Languages : en
Pages : 292
Book Description
High Power Impulse Magnetron Sputtering
Author: Daniel LundinPublisher: Elsevier
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Reactive Sputter Deposition
Author: Diederik DeplaPublisher: Springer Science & Business Media
ISBN: 3540766642
Category : Technology & Engineering
Languages : en
Pages : 584
Book Description
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Advanced Techniques for Surface Engineering
Author: W. GisslerPublisher: Springer Science & Business Media
ISBN: 9780792320067
Category : Technology & Engineering
Languages : en
Pages : 416
Book Description
The hardest requirements on a material are in general imposed at the surface: it has to be wear resistant for tools and bearings; corrosion resistant for turbine blades; antireflecting for solar cells; and it must combine several of these properties in other applications. `Surface engineering' is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both the more traditional methods, such as nitriding, boriding and carburizing, and the newer ones, such as ion implantation, laser beam melting and, in particular, coating. This book comprises and compares in a unique way all these techniques of surface engineering. It is a compilation of lectures which were held by renowned scientists and engineers in the frame of the well known `EuroCourses' of the Joint Research Centre of the Commission of the European Communities. The book is principally addressed to material and surface scientists, physicists and chemists, engineers and technicians of industries and institutes where surface engineering problems arise.