Proceedings of the Symposia on Reliability of Semiconductor Devices/interconnections and Dielectric Breakdown, and Laser Process for Microelectronic Applications PDF Download
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Author: Electrochemical Society. Dielectric Science and Technology Division Publisher: The Electrochemical Society ISBN: 9781566770033 Category : Technology & Engineering Languages : en Pages : 346
Book Description
Papers in this volume are from the 180th ECS Meeting, held in held in Phoenix, Arizona, Fall 1991. This symposium addresses all aspects of reliability of semiconductor devices, multilevel interconnection and dielectric breakdown in VLSI and ULSI technologies. The symposium establishes reliability from design through manufacturing. The second part of the symposium addresses laser ablation/etching, laser planarization laser/UV. CVD of metal end dielectric films, laser/UV enhanced etching and deposition processesing liquid phase, and photomodification of surfaces.
Author: Electrochemical Society. Dielectric Science and Technology Division Publisher: The Electrochemical Society ISBN: 9781566770033 Category : Technology & Engineering Languages : en Pages : 346
Book Description
Papers in this volume are from the 180th ECS Meeting, held in held in Phoenix, Arizona, Fall 1991. This symposium addresses all aspects of reliability of semiconductor devices, multilevel interconnection and dielectric breakdown in VLSI and ULSI technologies. The symposium establishes reliability from design through manufacturing. The second part of the symposium addresses laser ablation/etching, laser planarization laser/UV. CVD of metal end dielectric films, laser/UV enhanced etching and deposition processesing liquid phase, and photomodification of surfaces.
Author: David L. Elliott Publisher: Academic Press ISBN: 1483296512 Category : Science Languages : en Pages : 367
Book Description
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems
Author: American Chemical Society. Chemical Abstracts Service Publisher: ISBN: Category : Chemistry Languages : en Pages : 2064
Book Description
A key source to journal and conference abbreviations in the sciences. Although it focuses on chemistry, other scientific and engineering disciplines are also well represented. In addition to the abbreviation and full title, each entry also contains publishing info, title changes, language and frequency of publication, and libraries owning that title. Over 130,000 entries representing more than 70,000 publications dating back to 1907 are included.
Author: Electrochemical Society. Dielectric Science and Technology Division
Author: Electrochemical Society. Dielectric Science and Technology Division
Author: Hazara S. Rathore
Author: David L. Elliott
Author: 国立国会図書館 (Japan)
Author: American Chemical Society. Chemical Abstracts Service
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