Author: Dimitris DavazoglouPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 1240
Book Description
Thirteenth European Conference on Chemical Vapour Deposition
Author: Dimitris DavazoglouPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 1240
Book Description
10th Annual Conference on Composites and Advanced Ceramic Materials, Volume 7, Issue 7/8
Author: William J. SmothersPublisher: John Wiley & Sons
ISBN: 0470320699
Category : Technology & Engineering
Languages : en
Pages : 360
Book Description
This volume is part of the Ceramic Engineering and Science Proceeding (CESP) series. This series contains a collection of papers dealing with issues in both traditional ceramics (i.e., glass, whitewares, refractories, and porcelain enamel) and advanced ceramics. Topics covered in the area of advanced ceramic include bioceramics, nanomaterials, composites, solid oxide fuel cells, mechanical properties and structural design, advanced ceramic coatings, ceramic armor, porous ceramics, and more.
Proceedings in Print
Author: Processing and Fabrication of Advanced Materials for High Temperature Applications
Author: V. A. RaviPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 400
Book Description
These conference proceedings examine the processing of advanced materials like intermetallic matrix composites, metal matrix composites, ceramic matrix composites and high temperature coatings. They also deal with processes relating to manufacturing, joining and forming these novel materials.
Journal de physique
Author: Energy Research Abstracts
Author: Fundamentals of Electric Propulsion
Author: Dan M. GoebelPublisher: John Wiley & Sons
ISBN: 0470436263
Category : Technology & Engineering
Languages : en
Pages : 528
Book Description
Throughout most of the twentieth century, electric propulsion was considered the technology of the future. Now, the future has arrived. This important new book explains the fundamentals of electric propulsion for spacecraft and describes in detail the physics and characteristics of the two major electric thrusters in use today, ion and Hall thrusters. The authors provide an introduction to plasma physics in order to allow readers to understand the models and derivations used in determining electric thruster performance. They then go on to present detailed explanations of: Thruster principles Ion thruster plasma generators and accelerator grids Hollow cathodes Hall thrusters Ion and Hall thruster plumes Flight ion and Hall thrusters Based largely on research and development performed at the Jet Propulsion Laboratory (JPL) and complemented with scores of tables, figures, homework problems, and references, Fundamentals of Electric Propulsion: Ion and Hall Thrusters is an indispensable textbook for advanced undergraduate and graduate students who are preparing to enter the aerospace industry. It also serves as an equally valuable resource for professional engineers already at work in the field.
Toxicological Profile for Polycyclic Aromatic Hydrocarbons
Author: Publisher:
ISBN:
Category : Polycyclic aromatic hydrocarbons
Languages : en
Pages : 500
Book Description
Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author: