Author: Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 676
Book Description
Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference
Author: Proceedings of the ... Symposium on Electron, Ion and Laser Beam Technology
Author: Proceedings in Print
Author: Proceedings of the 14th Symposium on Electron, Ion, and Photon Beam Technology
Author: Ion Symposium on Electron (and Photon Beam Technology (14th : 1977 : Palo Alto, California).)Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 263
Book Description
Proceedings of The...Symposium on Electron, Ion, and Photon Beam Technology
Author: Solid State Research
Author: Lincoln LaboratoryPublisher:
ISBN:
Category : Solids
Languages : en
Pages : 304
Book Description
The Western Electric Engineer
Author: Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 842
Book Description
International Aerospace Abstracts
Author: Proceedings of the 14th Symposium on Electron, Ion, and Photon Beam Technology
Author: Ion Implantation: Equipment and Techniques
Author: H. RysselPublisher: Springer Science & Business Media
ISBN: 3642691560
Category : Science
Languages : en
Pages : 564
Book Description
The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.