Author: Saadah Abdul RahmanPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Preparation and Characterization of Hydrogenated Amorphous Silicon/silicon Nitride Superlattice
Author: Saadah Abdul RahmanAmorphous Silicon (a-Si:H)/silicon Nitride (a-SiNx:H) Superlattice by D.C. Plasma Enhanced Chemical Vapour Deposition
Author: Sufian Mousa Ibrahim MitaniPublisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 496
Book Description
Preparation and Characterization of Hydrogenated Amorphous Silicon
Author: James Jackson SlussPublisher:
ISBN:
Category : Amorphous substances
Languages : en
Pages : 110
Book Description
Silicon Nitride for Microelectronic Applications
Author: John T. MilekPublisher: Springer Science & Business Media
ISBN: 1468461621
Category : Technology & Engineering
Languages : en
Pages : 126
Book Description
The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation • 5 Introduction • 5 Direct Nitridation Method 8 Evaporation Method • 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.
Preparation and Characterization of Hydrogenated Amorphous Silicon Films
Author: Hwa ChaoPublisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 81
Book Description
Characterization of Fluorinated Hydrogenated Amorphous Silicon Nitride Alloys
Author: Jin Miao.4 ShenPublisher:
ISBN:
Category : Absorption spectra
Languages : en
Pages : 258
Book Description
Preparation and Characterization of Hydrogenated Amorphous Silicon
Author: Preparation and Characterization of Hydrogenated Amorphous Silicon
Author: T. M. DonovanPublisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 22
Book Description
Preparation and Characterization of Hydrogenated Amorphous Silicon; Final Technical Report; Period Covering 1 June 1980 - 31 May 1981
Author: Preparation of Hydrogenated Amorphous Silicon and Its Characterization by Transient Photoconductivity
Author: Christopher M. WalkerPublisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 320
Book Description