Author: Stanford University. Microwave LaboratoryPublisher:
ISBN:
Category :
Languages : en
Pages : 22
Book Description
Possible Solution for a Neutralized Ion Beam System
Author: Stanford University. Microwave LaboratoryPublisher:
ISBN:
Category :
Languages : en
Pages : 22
Book Description
Charge Neutralization Apparatus for Ion Implantation System
Author: Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Methods and apparatus for neutralization of a workpiece such as a semiconductor wafer in a system wherein a beam of positive ions is applied to the workpiece. The apparatus includes an electron source for generating an electron beam and a magnetic assembly for generating a magnetic field for guiding the electron beam to the workpiece. The electron beam path preferably includes a first section between the electron source and the ion beam and a second section which is coincident with the ion beam. The magnetic assembly generates an axial component of magnetic field along the electron beam path. The magnetic assembly also generates a transverse component of the magnetic field in an elbow region between the first and second sections of the electron beam path. The electron source preferably includes a large area lanthanum hexaboride cathode and an extraction grid positioned in close proximity to the cathode. The apparatus provides a high current, low energy electron beam for neutralizing charge buildup on the workpiece.
Production and Neutralization of Negative Ions and Beams: Eighth International Symposium/Production and Application of Light Negative Ions: Seventh European Workshop - A Joint Meeting
Author: Claude JacquotPublisher: American Inst. of Physics
ISBN: 9781563967375
Category : Science
Languages : en
Pages : 310
Book Description
Comprising the proceedings of the September 1997 symposium (called the Symposium with the Long Name by some insiders), this volume contains 28 contributions, arranged into five sections: fundamental processes; diagnostics; sources; negative ions acceleration; and applications and systems. With act
Production and Neutralization of Negative Ion Beams
Author: Ady HershcovitchPublisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 848
Book Description
Ion Beam Neutralization Processes for Electric Micropropulsion Applications
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 12
Book Description
While it is common knowledge that ion beams are easily neutralized using a variety of means, the precise process of neutralization remains unknown. With the increasing popularity of electric propulsion, and in particular micropropulsion systems, this question is of significant importance. Additionally, it has a bearing on thruster design, space instrument calibration, electrodynamic tethers, and ionospheric research. A review of the present state of knowledge on this topic is presented as well as results from ion beam simulations using 2D and 3D Particle-in-Cell codes. The grid generation methodology, adaptation, charged-particle transport, and field solver methodologies of the 3D code are reviewed. The simulations show electrons moving to neutralize the ion beam from background and neutralizer sources. The simulations show the dependence of neutralization on beam energy and the electron/ion velocity ratio. The results are compared favorably with previous computations and experimental observations.
Production and Neutralization of Negative Ions and Beams
Author: Krsto PrelecPublisher: AIP Conference Proceedings (Nu
ISBN:
Category : Science
Languages : en
Pages : 824
Book Description
Ion Implantation Technology - 94
Author: S. CoffaPublisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031
Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
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Author: 
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