Author: William H. LongPublisher:
ISBN:
Category :
Languages : en
Pages : 118
Book Description
Plasma Sheath Processes
Author: William H. LongPlasma Sheath Processes
Author: William H Long (Jr)Publisher:
ISBN:
Category :
Languages : en
Pages : 123
Book Description
A model of the plasma sheath in high pressure ionized gas flows is presented. Nonequilibrium electron energy distributions are determined from a numerical solution of the collisional Boltzmann equation in the presence of strong field and density gradients. Self-consistent coupling to the electric field, ion kinetics and gas dynamics is included. In subsonic flows, the sheath and the boundary layer can be treated independently. A stability analysis indicates two forms of thermal instability occur in the cathode sheath at high pressures. (Author).
Lecture Notes on Principles of Plasma Processing
Author: Francis F. ChenPublisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Plasma Processing of Materials
Author: National Research CouncilPublisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Principles of Plasma Discharges and Materials Processing
Author: Michael A. LiebermanPublisher: John Wiley & Sons
ISBN: 1394245378
Category : Technology & Engineering
Languages : en
Pages : 837
Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Basic processes of plasma physics - recent problems of sheath
Author: Principles of Plasma Discharges and Materials Processing
Author: Michael A. LiebermanPublisher: John Wiley & Sons
ISBN: 0471724246
Category : Science
Languages : en
Pages : 795
Book Description
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Principles of Plasma Discharges and Materials Processing
Author: Michael A. LiebermanPublisher: John Wiley & Sons
ISBN: 1394245394
Category : Technology & Engineering
Languages : en
Pages : 837
Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Advanced Concepts and Architectures for Plasma-Enabled Material Processing
Author: Oleg O. BaranovPublisher: Morgan & Claypool Publishers
ISBN: 1681739119
Category : Technology & Engineering
Languages : en
Pages : 92
Book Description
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
Plasma Processes and Polymers
Author: Riccardo d'AgostinoPublisher: John Wiley & Sons
ISBN: 3527605576
Category : Science
Languages : en
Pages : 545
Book Description
This volume compiles essential contributions to the most innovative fields of Plasma Processes and Polymers. High-quality contributions cover the fields of plasma deposition, plasma treatment of polymers and other organic compounds, plasma processes under partial vacuum and at atmospheric pressure, biomedical, textile, automotive, and optical applications as well as surface treatment of bulk materials, clusters, particles and powders. This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, Italy (ISPC-16, June 2003). A high class reference of relevance to a large audience in plasma community as well as in the area of its industrial applications.