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Plasma Enhanced Chemical Vapor Deposition on Living Substrates

Plasma Enhanced Chemical Vapor Deposition on Living Substrates PDF Author: Tsung-Chan Tsai
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
This dissertation proposed the idea of "plasma-enhanced chemical vapor deposition on living substrates (PECVD on living substrates)" to bridge the gap between the thin film deposition technology and the biological and living substrates. This study focuses on the establishment of the knowledge and techniques necessary to perform "PECVD on living substrates" and contains three main aspects: development, characterization, and biological applications. First, a PECVD tool which can operate in ambient air and at low temperature was developed using a helium dielectric barrier discharge jet (DBD jet). It was demonstrated that various materials, such as polymeric, metallic, and composite films, can be readily synthesized through this technique. Second, the PMMA and copper films deposited using DBD jets were characterized. High-rate (22 nm/s), low-temperature (39 °C) PMMA deposition was achieved and the film surface morphology can be tailored by altering the discharge power. Conductive copper films with an electrical resistivity lower than 1 x 10−7 ohm-m were obtained through hydrogen reduction. Both PMMA and copper films can be grown on temperature-sensitive substrates, such as plastics, pork skin, and even fingernail. The electrical, optical, and imaging characterization of the DBD jets was also conducted and several new findings were reported. Multiple short-duration current pulses instead of only one broad pulse per half voltage cycle were observed when a dielectric substrate was employed. Each short-duration current pulse is induced by a leading ionization wave followed by the formation of a plasma channel. Precursor addition further changed the temporal sequence of the pulses. An increase in the power led to a mode change from a diffuse DBD jet to a concentrated one. This mode change showed significant dependence on the precursor type, tube size, and electrode configuration. These findings regarding the discharge characteristics can thus facilitate the development of DBD-jet operation strategies to improve the deposition efficacy. Finally, this technique was used to grow PMMA films onto agar to demonstrate one of its potential biological applications: sterile bandage deposition. The DBD jet with the film depositing ability enabled the surface to be not only efficiently sanitized but also protected by a coating from being reached by bacteria. The electronic version of this dissertation is accessible from http://hdl.handle.net/1969.1/148233

Plasma Enhanced Chemical Vapor Deposition on Living Substrates

Plasma Enhanced Chemical Vapor Deposition on Living Substrates PDF Author: Tsung-Chan Tsai
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
This dissertation proposed the idea of "plasma-enhanced chemical vapor deposition on living substrates (PECVD on living substrates)" to bridge the gap between the thin film deposition technology and the biological and living substrates. This study focuses on the establishment of the knowledge and techniques necessary to perform "PECVD on living substrates" and contains three main aspects: development, characterization, and biological applications. First, a PECVD tool which can operate in ambient air and at low temperature was developed using a helium dielectric barrier discharge jet (DBD jet). It was demonstrated that various materials, such as polymeric, metallic, and composite films, can be readily synthesized through this technique. Second, the PMMA and copper films deposited using DBD jets were characterized. High-rate (22 nm/s), low-temperature (39 °C) PMMA deposition was achieved and the film surface morphology can be tailored by altering the discharge power. Conductive copper films with an electrical resistivity lower than 1 x 10−7 ohm-m were obtained through hydrogen reduction. Both PMMA and copper films can be grown on temperature-sensitive substrates, such as plastics, pork skin, and even fingernail. The electrical, optical, and imaging characterization of the DBD jets was also conducted and several new findings were reported. Multiple short-duration current pulses instead of only one broad pulse per half voltage cycle were observed when a dielectric substrate was employed. Each short-duration current pulse is induced by a leading ionization wave followed by the formation of a plasma channel. Precursor addition further changed the temporal sequence of the pulses. An increase in the power led to a mode change from a diffuse DBD jet to a concentrated one. This mode change showed significant dependence on the precursor type, tube size, and electrode configuration. These findings regarding the discharge characteristics can thus facilitate the development of DBD-jet operation strategies to improve the deposition efficacy. Finally, this technique was used to grow PMMA films onto agar to demonstrate one of its potential biological applications: sterile bandage deposition. The DBD jet with the film depositing ability enabled the surface to be not only efficiently sanitized but also protected by a coating from being reached by bacteria. The electronic version of this dissertation is accessible from http://hdl.handle.net/1969.1/148233

The Deposition of Inorganic Thin Films on Polymer Substrates by Plasma-enhanced Chemical Vapor Deposition

The Deposition of Inorganic Thin Films on Polymer Substrates by Plasma-enhanced Chemical Vapor Deposition PDF Author: Daniel Christian Guerin
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 296

Book Description


Chemical Vapor Deposition for Microelectronics

Chemical Vapor Deposition for Microelectronics PDF Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240

Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Chemical Vapor Deposition

Chemical Vapor Deposition PDF Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292

Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials

Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials PDF Author: Ashfaqul Islam Chowdhury
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 374

Book Description


Plasma Enhanced Chemical Vapor Deposition (PECVD) Method of Forming Vanadium Oxide Films and Vanadium Oxide Thin-films Prepared Thereby

Plasma Enhanced Chemical Vapor Deposition (PECVD) Method of Forming Vanadium Oxide Films and Vanadium Oxide Thin-films Prepared Thereby PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

Chemical Vapor Deposition

Chemical Vapor Deposition PDF Author: Srinivasan Sivaram
Publisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302

Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition PDF Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 458

Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Chemical Vapor Deposition

Chemical Vapor Deposition PDF Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686

Book Description


Chemical Vapor Deposition

Chemical Vapor Deposition PDF Author: Jong-Hee Park
Publisher: ASM International
ISBN: 161503224X
Category : Technology & Engineering
Languages : en
Pages : 477

Book Description