Author: Joseph Edward Schoenholtz
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Plasma-enhanced Chemical Vapor Deposition of Silicon Oxynitrides
Author: Joseph Edward Schoenholtz
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 390
Book Description
Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source
Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride
Author: William H. Ritchie
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 118
Book Description
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 118
Book Description
Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films
Author: Sui-Yuan Lynn
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 212
Book Description
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 212
Book Description
Study of Plasma-enhanced Chemical Vapor Deposition of Silicon Thin Films
Author: Guanghui Yao
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 148
Book Description
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 148
Book Description
Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films
Author: DW. Hess
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 8
Book Description
The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (
Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films
Plasma Enhanced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films
Author: Gina Marie Buccellato
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Deposition of Fluorinated Silicon Nitride Using Plasma Enhanced Chemical Vapor Deposition
Author: Mohammad Ibrahim Khan
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 334
Book Description
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 334
Book Description
Remote plasma enhanced chemical vapor deposition of silicon on silicon
Author: Brian George Anthony
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description