Author: Rafael Reif
Publisher:
ISBN:
Category : Silicon crystals
Languages : en
Pages : 13
Book Description
Plasma Enhanced Chemical Vapor Deposition of Silicon Epitaxial Layers
Author: Rafael Reif
Publisher:
ISBN:
Category : Silicon crystals
Languages : en
Pages : 13
Book Description
Publisher:
ISBN:
Category : Silicon crystals
Languages : en
Pages : 13
Book Description
Development of Heteroepitaxial Oxide Layers on Silicon Via Plasma Enhanced Chemical Vapor Deposition
Author: Jeffrey S. Lillé
Publisher:
ISBN:
Category : Silicon polymers
Languages : en
Pages : 414
Book Description
Publisher:
ISBN:
Category : Silicon polymers
Languages : en
Pages : 414
Book Description
Plasma Enhanced Chemical Vapor Deposition of In-situ Doped Epitaxial Silicon from Silane at Low Temperatures
Author: James Hartfiel Comfort
Publisher:
ISBN:
Category :
Languages : en
Pages : 352
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 352
Book Description
Chemical Vapor Deposition for Microelectronics
Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984
Author: McD. Robinson
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 828
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 828
Book Description
Low Temperature and Low Pressure Silicon Epitaxy by Plasma-Enhanced CVD
Author: R. Reif
Publisher:
ISBN:
Category : Autodoping
Languages : en
Pages : 3
Book Description
This paper reviews the most recent results obtained using a very low pressure, plasma enhanced chemical vapor deposition technique for low temperature (650-800°C) silicon epitaxy. Initial results on autodoping studies and on p-n junctions and MOS transistors fabricated in these films are briefly discussed.
Publisher:
ISBN:
Category : Autodoping
Languages : en
Pages : 3
Book Description
This paper reviews the most recent results obtained using a very low pressure, plasma enhanced chemical vapor deposition technique for low temperature (650-800°C) silicon epitaxy. Initial results on autodoping studies and on p-n junctions and MOS transistors fabricated in these films are briefly discussed.
Chemical Vapor Deposition
Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
The Production of Epitaxial Silicon Wafers Via Plasma Enhanced Chemical Vapor Deposition
Silicon Epitaxy
Author:
Publisher: Elsevier
ISBN: 0080541003
Category : Science
Languages : en
Pages : 514
Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.
Publisher: Elsevier
ISBN: 0080541003
Category : Science
Languages : en
Pages : 514
Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.
Epitaxial Growth of Silicon and Erbium Doped Silicon by Plasma Enhanced Chemical Vapor Deposition
Author: Matthew W. Deming
Publisher:
ISBN:
Category : Erbium
Languages : en
Pages : 170
Book Description
Publisher:
ISBN:
Category : Erbium
Languages : en
Pages : 170
Book Description