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Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1482222051 Category : Science Languages : en Pages : 414
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1482222051 Category : Science Languages : en Pages : 414
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1420012274 Category : Science Languages : en Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Author: Alexander Fridman Publisher: CRC Press ISBN: 9781560328483 Category : Science Languages : en Pages : 888
Book Description
Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.
Author: George Schmidt Publisher: Elsevier ISBN: 0323161766 Category : Science Languages : en Pages : 423
Book Description
Physics of High Temperature Plasmas, Second Edition focuses on plasma physics and the advances in this field. This book explores the experimental observations on linear waves and instabilities. Comprised of 11 chapters, this edition begins with an overview of heat transition as a result of the heating of a solid or liquid substance. This book then examines the behavior of plasmas, which has great significance for the understanding of our universe. This text also investigates the possible application of plasmas, such as the application of hot plasma as thermonuclear fuel. Other chapters discuss the laws of plasma physics, with emphasis on those phenomena that are relevant to the operation of thermonuclear machines. This text discusses as well the electromagnetic forces on an earthly scale, the quantum effects, particle collisions, and Maxwell's equation. The final chapter of the book deals with the motion of charged particles. This book is intended for researchers engaged in plasma research and graduate students taking a course in plasma physics.
Author: John Sheffield Publisher: Academic Press ISBN: 0080952038 Category : Science Languages : en Pages : 512
Book Description
This work presents one of the most powerful methods of plasma diagnosis in exquisite detail, to guide researchers in the theory and measurement techniques of light scattering in plasmas. Light scattering in plasmas is essential in the research and development of fusion energy, environmental solutions, and electronics.Referred to as the "Bible" by researchers, the work encompasses fusion and industrial applications essential in plasma research. It is the only comprehensive resource specific to the plasma scattering technique. It provides a wide-range of experimental examples and discussion of their principles with worked examples to assist researchers in applying the theory. - Computing techniques for solving basic equations helps researchers compare data to the actual experiment - New material on advances on the experimental side, such as the application of high density plasmas of inertial fusion - Worked out examples of the scattering technique for easier comprehension of theory
Author: Theodore Anderson Publisher: Artech House ISBN: 1630817511 Category : Technology & Engineering Languages : en Pages : 350
Book Description
This updated edition of an Artech House classic contains steering, focusing, and spreading of antenna beams using the physics of refraction of electromagnetic waves through a plasma. Pulsing circuitry for ionizing plasma antennas with low power requirements are covered. New and improved smart plasma antenna and applications to wi-fi and the applications of plasma antennas are discussed. Experimental work on plasma antenna noise and new progress on ruggedization and custom-made plasma tubes are also presented. This unique resource provides readers with a solid understanding of the efficient design and prototype development of plasma antennas to meet the challenge of reducing the power required to ionize the gas at various plasma densities. Thorough coverage of the technical underpinnings of plasma antennas, as well as important discussions on current markets and applications are discussed. Additionally, the book presents experimental work in this cutting-edge area and reveals the latest developments in the field.
Author: Michael Keidar Publisher: Academic Press ISBN: 0128137037 Category : Technology & Engineering Languages : en Pages : 587
Book Description
Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
Author: Yaffa Eliezer Publisher: Institute of Physics Publishing (GB) ISBN: Category : Science Languages : en Pages : 242
Book Description
Designed for the general science reader, this study explains the nature and properties of the fourth state of matter, known as plasma, the conditions under which it can form and some of the uses to which it might be put.
Author: R. D. Hazeltine Publisher: Courier Corporation ISBN: 0486151034 Category : Science Languages : en Pages : 484
Book Description
Graduate-level text examines the essential physics underlying international research in magnetic confinement fusion with accounts of fundamental concepts behind methods of confining plasma at or near thermonuclear conditions. 1992 edition.
Author: Francis F. Chen Publisher: Springer Science & Business Media ISBN: 1475755953 Category : Science Languages : en Pages : 427
Book Description
TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.
Author: Toshiaki Makabe
Author: Toshiaki Makabe
Author: Toshiaki Makabe
Author: Alexander Fridman
Author: George Schmidt
Author: John Sheffield
Author: Theodore Anderson
Author: Michael Keidar
Author: Yaffa Eliezer
Author: R. D. Hazeltine
Author: Francis F. Chen