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Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1420012274 Category : Science Languages : en Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1420012274 Category : Science Languages : en Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1482222051 Category : Science Languages : en Pages : 414
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Author: Toshiaki Makabe Publisher: CRC Press ISBN: 1482222108 Category : Science Languages : en Pages : 406
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Author: Peter-Klaus Budig Publisher: Routledge ISBN: 1000142957 Category : Computers Languages : en Pages : 734
Book Description
This book presents the vocabulary of a continually evolving and fundamental technical field which is finding ever broad applications in industry. It provides special attention to the language of national and international standards and recommendations, as well as appropriate field indications.
Author: Efim Oks Publisher: John Wiley & Sons ISBN: 3527609245 Category : Science Languages : en Pages : 181
Book Description
This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.
Author: Evgeniy G. Shustin Publisher: Cambridge Scholars Publishing ISBN: 1036405451 Category : Science Languages : en Pages : 115
Book Description
This book contains information on scientific research and applications of a very diverse field of low temperature plasma physics – the interaction of electron beams with plasma and, as a consequence of this interaction, a beam plasma discharge. It contains detailed descriptions of the history of the relevant research, a review of experimental research of properties of the low-temperature plasma with an electron beam and beam plasma discharge, and presents the main results of beam plasma interaction theory. Most of the book is devoted to descriptions of applications of the plasma with a beam and beam plasma discharge in a variety of fields; from studies of the physics of near-Earth space using active geophysical experiments to the development of materials technologies for micro- and nanoelectronics and designs of plasma-filled electronic devices. This book will be useful as an introduction to this field for undergraduate and graduate students specializing in plasma physics, as well as for other specialists in various fields of physics and technologies.
Author: Toshiaki Makabe
Author: Toshiaki Makabe
Author: Toshiaki Makabe
Author: Toshiaki Makabe
Author: 
Author: Defense Documentation Center (U.S.)
Author: Peter-Klaus Budig
Author: Efim Oks
Author: 
Author: I. N. Toumanov
Author: Evgeniy G. Shustin