Modelling Fluid Flow PDF Download

Author: János Vad
Publisher: Springer Science & Business Media
ISBN: 3662087979
Category : Technology & Engineering
Languages : en
Pages : 424

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Book Description
Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a recent international conference CMFF '03 on fluid technology. The lectures follow the current evolution and the newest challenges of the computational methods and measuring techniques related to fluid flow. The workshop summaries reflect the recent trends, open questions and unsolved problems in the mutually inspiring fields of experimental and computational fluid mechanics. The papers cover a wide range of fluids engineering, including reactive flow, chemical and process engineering, environmental fluid dynamics, turbulence modelling, numerical methods, and fluid machinery.

Author: Calvin G. Burnham
Publisher: World Scientific
ISBN: 9789971506100
Category : Science
Languages : en
Pages : 710

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Book Description
The development of high temperature superconductors is one of the major technological discoveries of this century. The impact and interactions from the scientific, technical, business and political aspects will be presented.

Author: Innocenzo Pinto
Publisher: Springer Science & Business Media
ISBN: 3642185967
Category : Science
Languages : en
Pages : 327

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Book Description
Provides the state of the art of modelling, simulation and calculation methods for electromagnetic fields and waves and their application.

Author: Hans J. Möller
Publisher: Springer Science & Business Media
ISBN: 3642934137
Category : Technology & Engineering
Languages : en
Pages : 399

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Book Description
This book summarizes the most recent aspects of polycrystalline semiconductors as presented at the conference Polycrystalline Semiconductors - Grain Boundaries and Interfaces. It contains 12 review articles on selected topics written by experts in their fields and 41 complementary contributed papers. The structure, chemistry and physics of grain boundaries and other interfaces are experimentally and theoretically studied. Aspects of the technologically important polycrystalline silicon are discussed in detail. Also covered are other polycrystalline semiconductors, germanium and compound semiconductors, that are currently of interest in fundamental research and in the technology of solar cells and thin film devices. Anyone interested in polycrystalline semiconductors will be able to use this comprehensive collection to advantage. It also suggests directions for new research and development.

Author: Jean-Baptiste Donnet
Publisher: Routledge
ISBN: 135146261X
Category : Science
Languages : en
Pages : 484

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Book Description
The second edition of this reference provides comprehensive examinations of developments in the processing and applications of carbon black, including the use of new analytical tools such as scanning tunnelling microscopy, Fourier transform infrared spectroscopy and inverse gas chromatography.;Completely rewritten and updated by numerous experts in the field to reflect the enormous growth of the field since the publication of the previous edition, Carbon Black: discusses the mechanism of carbon black formation based on recent advances such as the discovery of fullerenes; elucidates micro- and macrostructure morphology and other physical characteristics; outlines the fractal geometry of carbon black as a new approach to characterization; reviews the effect of carbon black on the electrical and thermal conductivity of filled polymers; delineates the applications of carbon black in elastomers, plastics, and zerographic toners; and surveys possible health consequences of exposure to carbon black.;With over 1200 literature citations, tables, and figures, this resource is intended for physical, polymer, surface and colloid chemists; chemical and plastics engineers; spectroscopists; materials scientists; occupational safety and health physicians; and upper-level undergraduate and graduate students in these disciplines.

Author: Paul Siffert
Publisher: Springer Science & Business Media
ISBN: 3662098970
Category : Technology & Engineering
Languages : en
Pages : 552

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Book Description
With topics ranging from epitaxy through lattice defects and doping to quantum computation, this book provides a personalized survey of the development and use of silicon, the basis for the revolutionary changes in our lives sometimes called "The Silicon Age." Beginning with the very first developments more than 50 years ago, this reports on all aspects of silicon and silicon technology up to its use in exciting new technologies, including a glance at possible future developments.

Author: Harold Weinstock
Publisher: Springer Science & Business Media
ISBN: 3642838855
Category : Technology & Engineering
Languages : en
Pages : 451

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Book Description
The genesis of the NATO Advanced Study Institute (ASI) upon which this volume is based, occurred during the summer of 1986 when we came to the realization that there had been significant progress during the early 1980's in the field of superconducting electronics and in applications of this technology. Despite this progress, there was a perception among many engineers and scientists that, with the possible exception of a limited number of esoteric fundamental studies and applications (e.g., the Josephson voltage standard or the SQUID magnetometer), there was no significant future for electronic systems incorporating superconducting elements. One of the major reasons for this perception was the aversion to handling liquid helium or including a closed-cycle helium liquefier. In addition, many critics felt that IBM's cancellation of its superconducting computer project in 1983 was "proof" that superconductors could not possibly compete with semiconductors in high-speed signal processing. From our perspective, the need for liquid helium was outweighed by improved performance, i. e., higher speed, lower noise, greater sensitivity and much lower power dissipation. For many commercial, medical, scientific and military applications, these attributes can lead to either enhanced capability (e.g., compact real-time signal processing) or measurements that cannot be made using any other technology (e.g., SQUID magnetometry to detect neuromagnetic activity).

Author: H. Ryssel
Publisher: Springer Science & Business Media
ISBN: 3642691560
Category : Science
Languages : en
Pages : 564

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Book Description
The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.

Author: Michel Andre Aegerter
Publisher: Springer Science & Business Media
ISBN: 0387889531
Category : Technology & Engineering
Languages : en
Pages : 474

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Book Description
Sol-Gel Techniques for Glass Producers and Users provides technological information, descriptions and characterizations of prototypes, or products already on the market, and illustrates advantages and disadvantages of the sol-gel process in comparison to other methods. The first chapter entitled "Wet Chemical Technology" gives a summary of the basic principles of the sol-gel chemistry. The most promising applications are related to coatings. Chapter 2 describes the various "Wet Chemical Coating Technologies" from glass cleaning to many deposition and post-coating treatment techniques. These include patterning of coatings through direct or indirect techniques which have became very important and for which the sol-gel processing is particularly well adapted. Chapter 3 entitled "Bulk Glass Technologies" reports on the preparation of special glasses for different applications. Chapter 4 entitled "Coatings and Materials Properties" describes the properties of the different coatings and the sol-gel materials, fibers and powders. The chapter also includes a section dedicated to the characterization techniques especially applied to sol-gel coatings and products.

Author: Michael J. Kelly
Publisher: Springer Science & Business Media
ISBN: 3642714463
Category : Technology & Engineering
Languages : en
Pages : 481

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Book Description
les Houches This Winter School on "The Physics and Fabrication of Microstructures" originated with a European industrial decision to investigate in some detail the potential of custom-designed microstructures for new devices. Beginning in 1985, GEC and THOMSON started a collaboration on these subjects, supported by an ESPRIT grant from the Commission of the European Com munity. To the outside observer of the whole field, it appears clear that the world effort is very largely based in the United States and Japan. It also appears that cooperation and dissemination of results are very well organised outside Europe and act as a major influence on the development of new concepts and devices. In Japan, a main research programme of the Research and Development for Basic Technology for Future Industries is focused on "Future Electron Devices". In Japan and in the United States, many workshops are organised annually in order to bring together the major specialists in industry and academia, allowing fast dissemination of advances and contacts for setting up cooperative efforts.