Author: Publisher:
ISBN: 9780983693383
Category :
Languages : en
Pages :
Book Description
Papers from the 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Author: Papers from the 48th International Conference on Electron, Ion, and PhotonBeam Technology and Nanofabrication
Author: International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. 48, 2004, San Diego, Calif..Publisher:
ISBN:
Category :
Languages : en
Pages : 838
Book Description
Papers from the 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2010)
Author: Franklin SchellenbergPublisher:
ISBN: 9780982301265
Category : Nanoscience
Languages : en
Pages : 1
Book Description
Papers from the 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Author: Papers from the 57th International Symposium on Electron, Ion and Photon Beam Technologyand Nanofabrication
Author: Leonidas E. OcolaStudent Support for EIPBN 2016 Conference - Final Report
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
The 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) was held in Pittsburgh, PA, from May 31st to June 3rd, 2016. The conference received technical co-sponsorship from the American Vacuum Society (AVS) in cooperation with the Optical Society of America (OSA), and the American Physical Society (APS). The conference was a great success in large part because financial support allowed robust participation from students. The students gave oral and poster presentations of their research and many published peer-reviewed articles in a special conference issue of the Journal of Vacuum Science and Technology B. The Department of Energy Office of Basic Energy Sciences supported 10 students from US universities with a $5,000 grant (DE-SC0015555).
Index of Conference Proceedings
Author: British Library. Document Supply CentrePublisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 844
Book Description
EUV Lithography
Author: Vivek BakshiPublisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Vacuum Electronics
Author: Joseph A. EichmeierPublisher: Springer Science & Business Media
ISBN: 3540719296
Category : Technology & Engineering
Languages : en
Pages : 548
Book Description
Nineteen experts from the electronics industry, research institutes and universities have joined forces to prepare this book. It does nothing less than provide a complete overview of the electrophysical fundamentals, the present state of the art and applications, as well as the future prospects of microwave tubes and systems. The book does the same for optoelectronics vacuum devices, electron and ion beam devices, light and X-ray emitters, particle accelerators and vacuum interrupters.
Electrical & Electronics Abstracts
Author: Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1860
Book Description