Optimization of RF Discharges Used for Plasma Etching PDF Download

Author: Joseph Taillet
Publisher:
ISBN:
Category :
Languages : en
Pages :

View

Book Description

Author: M. Sugawara
Publisher: OUP Oxford
ISBN: 0191590290
Category : Technology & Engineering
Languages : en
Pages : 362

View

Book Description
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Author: Marco Haverlag
Publisher:
ISBN:
Category :
Languages : en
Pages : 133

View

Book Description

Author: S. Vepřek
Publisher:
ISBN:
Category : Plasma chemistry
Languages : en
Pages : 864

View

Book Description

Author: Vahid Vahedi
Publisher:
ISBN:
Category : Plasma dynamics
Languages : en
Pages : 316

View

Book Description

Author: Sanjay S. Pande
Publisher: Springer
ISBN: 9811087679
Category : Technology & Engineering
Languages : en
Pages : 444

View

Book Description
This book introduces readers to various tools and techniques for the design of precision, miniature products, assemblies and associated manufacturing processes. In particular, it focuses on precision mechanisms, robotic devices and their control strategies, together with case studies. In the context of manufacturing process, the book highlights micro/nano machining/forming processes using non-conventional energy sources such as lasers, EDM (electro-discharge machining), ECM (electrochemical machining), etc. Techniques for achieving optimum performance in process modeling, simulation and optimization are presented. The applications of various research tools such as FEM (finite element method), neural networks, genetic algorithms, etc. to product-process design and optimization are illustrated through case studies. The state-of-the-art material presented here provides valuable directions for product development and future research work in this area. The contents of this book will be of use to researchers and industry professionals alike.

Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88

View

Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author: Electrochemical Society
Publisher:
ISBN:
Category : Electrochemistry
Languages : en
Pages : 1198

View

Book Description

Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664

View

Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author: Loucas G. Christophorou
Publisher: Elsevier
ISBN: 1483191079
Category : Science
Languages : en
Pages : 702

View

Book Description
Gaseous Dielectrics V presents the proceedings of the Fifth International Symposium on Gaseous Dielectrics, held in Knoxville, Tennessee on May 3–7, 1987. This book discusses the effective coupling between basic and applied research and technology achieved in this area. Organized into 12 chapters, this book begins with an overview of the status of theoretical calculations of excitation and ionization coefficients for electrons. This text then provides an extensive investigation into different phases of discharge development in electronegative gases. Other chapters consider the use of sulfur hexafluoride as a dielectric medium in rail systems and gas circuit breakers. This book reviews as well the primary requirements for a successful gas analysis program, with emphasis on measurement and interpretation methods. The final chapter deals with the progress in dielectric quality assurance of gas insulated substations (GIS), which has resulted from improved scientific knowledge of significant phenomena. This book is a valuable resource for electrical and electronics engineers.