Author: Veronica S. KyriacouPublisher:
ISBN:
Category : Gallium
Languages : en
Pages : 194
Book Description
Optimization of Reactive Ionized Cluster Beam (R-ICB) Techique for Deposition of GaN Films
Author: Veronica S. KyriacouPublisher:
ISBN:
Category : Gallium
Languages : en
Pages : 194
Book Description
Study of Ionized Cluster Beam Techniques for Reactive Deposition of Gallium Nitride Thin Films
Author: Jyh SheenPublisher:
ISBN:
Category : Electrophoretic deposition
Languages : en
Pages : 224
Book Description
Ionized-Cluster Beam Deposition and Epitaxy
Author: Toshinori TakagiPublisher: Univ. Press of Mississippi
ISBN: 9780815511687
Category : Technology & Engineering
Languages : en
Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Analysis of Ionized Cluster Beam Thin Film Deposition
Author: Dave TurnerHandbook of Ion Beam Processing Technology
Author: Jerome J. CuomoPublisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464
Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Granular Alloy Film Synthesis Using Ionized Cluster Beam Deposition
Author: Margolita Mia PollackPublisher:
ISBN:
Category :
Languages : en
Pages : 202
Book Description
Thin Film Deposition by the Ionized Cluster Beam Method
Author: Syed Ejazul HuqIon Beam-Enhanced Deposition and Ionized Cluster Beam Deposition
Author: James K. HirvonenPublisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.
The Materials Science of Thin Films
Author: Milton OhringPublisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744
Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
Introduction to Surface and Thin Film Processes
Author: John VenablesPublisher: Cambridge University Press
ISBN: 9780521785006
Category : Science
Languages : en
Pages : 392
Book Description
This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.