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Author: Alfred Kwok-Kit Wong Publisher: SPIE Press ISBN: 9780819458292 Category : Technology & Engineering Languages : en Pages : 280
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Alfred Kwok-Kit Wong Publisher: SPIE Press ISBN: 9780819458292 Category : Technology & Engineering Languages : en Pages : 280
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Charles J. Alpert Publisher: CRC Press ISBN: 1000654192 Category : Computers Languages : en Pages : 1044
Book Description
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Author: Bernard C. Kress Publisher: John Wiley & Sons ISBN: 9780470022641 Category : Science Languages : en Pages : 638
Book Description
Miniaturization and mass replications have begun to lead the optical industry in the transition from traditional analog to novel digital optics. As digital optics enter the realm of mainstream technology through the worldwide sale of consumer electronic devices, this timely book aims to present the topic of digital optics in a unified way. Ranging from micro-optics to nanophotonics, and design to fabrication through to integration in final products, it reviews the various physical implementations of digital optics in either micro-refractives, waveguide (planar lightwave chips), diffractive and hybrid optics or sub-wavelength structures (resonant gratings, surface plasmons, photonic crystals and metamaterials). Finally, it presents a comprehensive list of industrial and commercial applications that are taking advantage of the unique properties of digital optics. Applied Digital Optics is aimed primarily at optical engineers and product development and technical marketing managers; it is also of interest to graduate-level photonics students and micro-optic foundries. Helps optical engineers review and choose the appropriate software tools to design, model and generate fabrication files. Gives product managers access to an exhaustive list of applications available in today’s market for integrating such digital optics, as well as where the next potential application of digital optics might be. Provides a broad view for technical marketing managers in all aspects of digital optics, and how such optics can be classified. Explains the numerical implementation of optical design and modelling techniques. Enables micro-optics foundries to integrate the latest fabrication and replication techniques, and accordingly fine tune their own fabrication processes.
Author: Xu Ma Publisher: John Wiley & Sons ISBN: 111804357X Category : Technology & Engineering Languages : en Pages : 225
Book Description
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Author: Chris Mack Publisher: John Wiley & Sons ISBN: 1119965071 Category : Technology & Engineering Languages : en Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Gerhard Kloos Publisher: SPIE Press ISBN: 9780819467805 Category : Mathematics Languages : en Pages : 144
Book Description
This book is intended to familiarize the reader with the method of Gaussian matrices and some related tools of optical design. The matrix method provides a means to study an optical system in the paraxial approximation. This text contains new results such as theorems on the design of variable optics, on integrating rods, on the optical layout of prism devices, etc. The results are derived in a step-by-step way so that the reader might apply the methods presented here to resolve design problems with ease.
Author: Allen Mann Publisher: SPIE Press ISBN: 0819476676 Category : Photography Languages : en Pages : 184
Book Description
Ten years after the publication of Infrared Optics and Zoom Lenses, this text is still the only current publication devoted exclusively to infrared zoom lenses. This updated second edition includes 18 new refractive and reflective infrared zoom systems, bringing the total number of infrared zoom optical systems to 41 systems. Other additions include a section on focal plane arrays and a new closing chapter specifically devoted to applications of infrared zoom lenses. Coverage of wavelength region has been expanded to include the near infrared. Additional topics include an examination of the importance of principal planes, methods for athermalization by means of computer glass substitution, and global optimization techniques for zoom lens design.
Author: Stephen Marshall Publisher: SPIE Press ISBN: 9780819463432 Category : Computers Languages : en Pages : 168
Book Description
This text provides insight into the design of optimal image processing operators for implementation directly into digital hardware. Starting with simple restoration examples and using the minimum of statistics, the book provides a design strategy for a wide range of image processing applications. The text is aimed principally at electronics engineers and computer scientists, but will also be of interest to anyone working with digital images.
Author: Scott W. Teare Publisher: SPIE Press ISBN: 9780819464347 Category : Computers Languages : en Pages : 116
Book Description
The use of image stabilization has grown to the point that it is now a common component of modern optical systems for imaging, communications, and remote-sensing applications. The benefits of image stabilization to astronomical research alone are so rich that it is common for astronomical telescopes, built over the last century, to be retrofitted with fast steering mirrors and tip-tilt sensors to extend their useful lifetimes. This text provides the basics of image stabilization starting with a consideration of the cause of image blurring and an introduction to the components commonly used in constructing a stabilized imaging system. With this foundation, an example image stabilized system is described and used to introduce some of the important parameters in evaluating the performance of image stabilization systems. As image stabilization systems are key components of adaptive optics systems, the more sophisticated sensing and correction devices used in this area are briefly addressed. Rather than being a mathematical, rigorous treatment of image stabilization, it provides the basic ideas in an easy-to-read format.
Author: Herbert Kaplan Publisher: SPIE Press ISBN: 9780819467232 Category : Technology & Engineering Languages : en Pages : 196
Book Description
\- Preface - List of Figures - List of Tables - List of Acronyms and Abbreviations - Preface - Introduction - Basics of Noncontact Thermal Measurement - Matching the Instrument to the Application - Instruments Overview - Using IR Sensing and Imaging Instruments - Introduction to Applications - Plant Condition Monitoring and Predictive Maintenance - Buildings and Infrastructure - Materials Testing - Product and Process Monitoring Control - Night Vision, Security, and Surveillance - Life Sciences Thermography - Appendix A: Commercial Instrument Performance Characteristics - Appendix B: Manufacturers of IR Sensing and Imaging Instruments - Appendix C: Table of Generic Normal Emissivities of Materials - Appendix D: A Glossary of Terms for the Infrared Thermographer
Author: Alfred Kwok-Kit Wong
Author: Alfred Kwok-Kit Wong
Author: Charles J. Alpert
Author: Bernard C. Kress
Author: Xu Ma
Author: Chris Mack
Author: Gerhard Kloos
Author: Allen Mann
Author: Stephen Marshall
Author: Scott W. Teare
Author: Herbert Kaplan