Author: Moushab Benkahoul
Publisher:
ISBN:
Category :
Languages : en
Pages : 82
Book Description
Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering
Reactive Direct Current Magnetron Sputtering of Ultrathin Superconducting Niobium Nitride Films
Author: Andrew Edward Dane
Publisher:
ISBN:
Category :
Languages : en
Pages : 101
Book Description
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical temperature were measured for a large number of samples. Film Tc was improved by changing the way the samples were heated during the deposition, by ex situ rapid thermal processing, and in some cases by the addition of an RF bias to the substrate holder during the sputter deposition. These improvements to the deposition of NbN have enabled the production of superconducting nanowire single photon detectors whose quantum efficiency saturates and was the starting point for work on the superconductor-insulator transition.
Publisher:
ISBN:
Category :
Languages : en
Pages : 101
Book Description
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical temperature were measured for a large number of samples. Film Tc was improved by changing the way the samples were heated during the deposition, by ex situ rapid thermal processing, and in some cases by the addition of an RF bias to the substrate holder during the sputter deposition. These improvements to the deposition of NbN have enabled the production of superconducting nanowire single photon detectors whose quantum efficiency saturates and was the starting point for work on the superconductor-insulator transition.
The Ion-beam Reactive Sputtering Process for Deposition of Niobium Nitride Thin Films
Author: Daniel Jenner Lichtenwalner
Publisher:
ISBN:
Category :
Languages : en
Pages : 658
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 658
Book Description
Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films. Two types of pulsed DC (unipolar and asymmetric bipolar) were studied with respect to characteristics and properties of resultant films. The unipolar power supply generates a series of 75 kHz DC pulses modulated with 2.5 kHz frequency. The frequency of asymmetric power supply can be varied from 50 kHz to 250 kHz. The duty cycle, which is a ratio of negative pulse time to total time, can be varied from 60% to 98%. Very fast oscillation and overshoot were observed when the polarity of the target voltage was changed. The control of crystal orientation of deposited film is important since the properties of AlN film is related with the orientation. For example, the acoustic velocity is high along the c-axis. The electromechanical coupling coefficient is large in a-axis direction. The crystal orientation and microstructure of the AlN films were strongly affected by the deposition conditions such as sputtering power, growth temperature, sputtering gas pressure and frequency/duty cycle. The crystal orientation of AlN films was closely related with the energy of sputtered atoms and mobility of adatoms on substrate. The c-axis oriented films were obtained when the target power and growth temperature were high. This provided higher energy of sputtered atoms and mobility of adatoms. The deposited AlN films have a columnar structure. The crystal orientation of the AlN films was changed from (101) to (002) by applying an RF bias was applied to the substrate in unipolar pulsed DC sputtering. The columnar structure disappeared when the RF bias was applied to the substrate. Applying bias was thought to increase mobility of adatoms by ion bombardment. MIM (aluminum-AlN-aluminum or molybdenum) structure was fabricated to measure electric properties of AlN films. Dielectric constants of 8.5 to 11.5 were obtained at 100 kHz. Th.
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films. Two types of pulsed DC (unipolar and asymmetric bipolar) were studied with respect to characteristics and properties of resultant films. The unipolar power supply generates a series of 75 kHz DC pulses modulated with 2.5 kHz frequency. The frequency of asymmetric power supply can be varied from 50 kHz to 250 kHz. The duty cycle, which is a ratio of negative pulse time to total time, can be varied from 60% to 98%. Very fast oscillation and overshoot were observed when the polarity of the target voltage was changed. The control of crystal orientation of deposited film is important since the properties of AlN film is related with the orientation. For example, the acoustic velocity is high along the c-axis. The electromechanical coupling coefficient is large in a-axis direction. The crystal orientation and microstructure of the AlN films were strongly affected by the deposition conditions such as sputtering power, growth temperature, sputtering gas pressure and frequency/duty cycle. The crystal orientation of AlN films was closely related with the energy of sputtered atoms and mobility of adatoms on substrate. The c-axis oriented films were obtained when the target power and growth temperature were high. This provided higher energy of sputtered atoms and mobility of adatoms. The deposited AlN films have a columnar structure. The crystal orientation of the AlN films was changed from (101) to (002) by applying an RF bias was applied to the substrate in unipolar pulsed DC sputtering. The columnar structure disappeared when the RF bias was applied to the substrate. Applying bias was thought to increase mobility of adatoms by ion bombardment. MIM (aluminum-AlN-aluminum or molybdenum) structure was fabricated to measure electric properties of AlN films. Dielectric constants of 8.5 to 11.5 were obtained at 100 kHz. Th.
The Development and Characterisation of Advanced Ternary Nitride Thin Films Deposited by Reactive D.C Magnetron Co-sputtering Technology
Author: Richard Wuhrer
Publisher:
ISBN:
Category : Magnetrons
Languages : en
Pages : 644
Book Description
Publisher:
ISBN:
Category : Magnetrons
Languages : en
Pages : 644
Book Description
Novel Nanocomposite Coatings
Author: Rostislav Daniel
Publisher: CRC Press
ISBN: 9814411175
Category : Technology & Engineering
Languages : en
Pages : 346
Book Description
Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline materials, which have met their limits in many recent engineering applications. In particular, nanocomposite coatings synthesized by plasma-assisted deposition processes under highly non-equilibrium conditions provide a high potential for new applications as protective and functional coatings in automotive, aerospace, tooling, electronic, or manufacturing industry. This book provides a comprehensive overview of the synthesis of Si-containing hard nanocomposite coatings based on transition metal nitrides by plasma-based thin film processing. It demonstrates the full versatility of these nanocomposites for low Si-containing coatings tailored with superior mechanical properties and novel high Si-containing nanocomposite coatings with extraordinary thermal stability and resistance against oxidation optimized for high-temperature applications. It pays special attention to understanding growth mechanisms of these structures under specific deposition conditions, structure–property relations, and stability of individual constituents to enhance their functionality for various applications.
Publisher: CRC Press
ISBN: 9814411175
Category : Technology & Engineering
Languages : en
Pages : 346
Book Description
Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline materials, which have met their limits in many recent engineering applications. In particular, nanocomposite coatings synthesized by plasma-assisted deposition processes under highly non-equilibrium conditions provide a high potential for new applications as protective and functional coatings in automotive, aerospace, tooling, electronic, or manufacturing industry. This book provides a comprehensive overview of the synthesis of Si-containing hard nanocomposite coatings based on transition metal nitrides by plasma-based thin film processing. It demonstrates the full versatility of these nanocomposites for low Si-containing coatings tailored with superior mechanical properties and novel high Si-containing nanocomposite coatings with extraordinary thermal stability and resistance against oxidation optimized for high-temperature applications. It pays special attention to understanding growth mechanisms of these structures under specific deposition conditions, structure–property relations, and stability of individual constituents to enhance their functionality for various applications.
Chemical Vapor Deposition of Niobium Nitride Thin Films and Superconducting Properties
Author: Ching-ho Wang
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 88
Book Description
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 88
Book Description
Plasma Physics
Author: Alexander Piel
Publisher: Springer
ISBN: 3319634275
Category : Science
Languages : en
Pages : 473
Book Description
The enlarged new edition of this textbook provides a comprehensive introduction to the basic processes in plasmas and demonstrates that the same fundamental concepts describe cold gas-discharge plasmas, space plasmas, and hot fusion plasmas. Starting from particle drifts in magnetic fields, the principles of magnetic confinement fusion are explained and compared with laser fusion. Collective processes are discussed in terms of plasma waves and instabilities. The concepts of plasma description by magnetohydrodynamics, kinetic theory, and particle simulation are stepwise introduced. Space charge effects in sheath regions, double layers and plasma diodes are given the necessary attention. The novel fundamental mechanisms of dusty plasmas are explored and integrated into the framework of conventional plasmas. The book concludes with a concise description of modern plasma discharges. Written by an internationally renowned researcher in experimental plasma physics, the text keeps the mathematical apparatus simple and emphasizes the underlying concepts. The guidelines of plasma physics are illustrated by a host of practical examples, preferentially from plasma diagnostics. There, Langmuir probe methods, laser interferometry, ionospheric sounding, Faraday rotation, and diagnostics of dusty plasmas are discussed. Though primarily addressing students in plasma physics, the book is easily accessible for researchers in neighboring disciplines, such as space science, astrophysics, material science, applied physics, and electrical engineering. This second edition has been thoroughly revised and contains substantially enlarged chapters on plasma diagnostics, dusty plasmas and plasma discharges. Probe techniques have been rearranged into basic theory and a host of practical examples for probe techniques in dc, rf, and space plasmas. New topics in dusty plasmas, such as plasma crystals, Yukawa balls, phase transitions and attractive forces have been adopted. The chapter on plasma discharges now contains a new section on conventional and high-power impulse magnetron sputtering. The recently discovered electrical asymmetry effect in capacitive rf-discharges is described. The text is based on an introductory course to plasma physics and advanced courses in plasma diagnostics, dusty plasmas, and plasma waves, which the author has taught at Kiel University for three decades. The pedagogical approach combines detailed explanations, a large number of illustrative figures, short summaries of the basics at the end of each chapter, and a selection of problems with detailed solutions.
Publisher: Springer
ISBN: 3319634275
Category : Science
Languages : en
Pages : 473
Book Description
The enlarged new edition of this textbook provides a comprehensive introduction to the basic processes in plasmas and demonstrates that the same fundamental concepts describe cold gas-discharge plasmas, space plasmas, and hot fusion plasmas. Starting from particle drifts in magnetic fields, the principles of magnetic confinement fusion are explained and compared with laser fusion. Collective processes are discussed in terms of plasma waves and instabilities. The concepts of plasma description by magnetohydrodynamics, kinetic theory, and particle simulation are stepwise introduced. Space charge effects in sheath regions, double layers and plasma diodes are given the necessary attention. The novel fundamental mechanisms of dusty plasmas are explored and integrated into the framework of conventional plasmas. The book concludes with a concise description of modern plasma discharges. Written by an internationally renowned researcher in experimental plasma physics, the text keeps the mathematical apparatus simple and emphasizes the underlying concepts. The guidelines of plasma physics are illustrated by a host of practical examples, preferentially from plasma diagnostics. There, Langmuir probe methods, laser interferometry, ionospheric sounding, Faraday rotation, and diagnostics of dusty plasmas are discussed. Though primarily addressing students in plasma physics, the book is easily accessible for researchers in neighboring disciplines, such as space science, astrophysics, material science, applied physics, and electrical engineering. This second edition has been thoroughly revised and contains substantially enlarged chapters on plasma diagnostics, dusty plasmas and plasma discharges. Probe techniques have been rearranged into basic theory and a host of practical examples for probe techniques in dc, rf, and space plasmas. New topics in dusty plasmas, such as plasma crystals, Yukawa balls, phase transitions and attractive forces have been adopted. The chapter on plasma discharges now contains a new section on conventional and high-power impulse magnetron sputtering. The recently discovered electrical asymmetry effect in capacitive rf-discharges is described. The text is based on an introductory course to plasma physics and advanced courses in plasma diagnostics, dusty plasmas, and plasma waves, which the author has taught at Kiel University for three decades. The pedagogical approach combines detailed explanations, a large number of illustrative figures, short summaries of the basics at the end of each chapter, and a selection of problems with detailed solutions.
High Power Impulse Magnetron Sputtering
Author: Daniel Lundin
Publisher:
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Publisher:
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Optical Properties of Ultra-thin Niobium Nitride Films for Single Photon Detectors
Author: Lucy Elizabeth Archer
Publisher:
ISBN:
Category :
Languages : en
Pages : 78
Book Description
In this thesis I made a study of the properties of reactively sputtered ultra-thin films of niobium nitride (NbN) and niobium titanium nitride (NbTiN). Using Variable Angle Spectral Ellipsometry (VASE), I found that the optical properties of NbN films appear to have a critical thickness above which the optical parameters stabilize. I also found that the deposition process has better stability over time for thicker films than for thinner ones; that is, when films are deposited weeks apart, the thinner films show more variation in thickness and optical properties than do the thicker films. The data also suggest that the crystallinity of the substrate upon which the NbN is deposited has a significant effect on the optical parameters. The set of films deposited for the optical study was also tested against a universal scaling law for thin film superconductors, which seems to support the existence of the critical thickness, below which the properties change significantly and do not conform to the power law scaling that holds for thicker films. Finally, I explored recipes for depositing NbTiN with our sputtering system, in the hope of creating films that have better properties than NbN to be used in device manufacturing. I was able to create films with the same properties as our current NbN films with minimal optimization, and further work in this area should result in NbTiN films that are better than our NbN films.
Publisher:
ISBN:
Category :
Languages : en
Pages : 78
Book Description
In this thesis I made a study of the properties of reactively sputtered ultra-thin films of niobium nitride (NbN) and niobium titanium nitride (NbTiN). Using Variable Angle Spectral Ellipsometry (VASE), I found that the optical properties of NbN films appear to have a critical thickness above which the optical parameters stabilize. I also found that the deposition process has better stability over time for thicker films than for thinner ones; that is, when films are deposited weeks apart, the thinner films show more variation in thickness and optical properties than do the thicker films. The data also suggest that the crystallinity of the substrate upon which the NbN is deposited has a significant effect on the optical parameters. The set of films deposited for the optical study was also tested against a universal scaling law for thin film superconductors, which seems to support the existence of the critical thickness, below which the properties change significantly and do not conform to the power law scaling that holds for thicker films. Finally, I explored recipes for depositing NbTiN with our sputtering system, in the hope of creating films that have better properties than NbN to be used in device manufacturing. I was able to create films with the same properties as our current NbN films with minimal optimization, and further work in this area should result in NbTiN films that are better than our NbN films.