Author: Theodor WeissPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
New Strategy for Mechanistic Studies of Chemical Vapor Deposition Processes Under UHV Conditions
Author: Theodor WeissNew Strategy for Mechanistic Studies of Chemical Vapor Deposition Processes Under UHV Conditions
Author: Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces
Author: Elizabeth Larson CranePublisher:
ISBN:
Category :
Languages : en
Pages : 336
Book Description
Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films from Organometallic Precursors
Author: Jinwoo CheonMechanistic Studies of Organometallic Chemical Vapor Deposition of Metal Thin Films
Author: Michael Yingmin WeiPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 132
Book Description
Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566773195
Category : Science
Languages : en
Pages : 526
Book Description
Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 458
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Chemical Vapor Deposition
Author: Srinivasan SivaramPublisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Luminous Chemical Vapor Deposition and Interface Engineering
Author: Hirotsugu YasudaPublisher: CRC Press
ISBN: 1420030299
Category : Science
Languages : en
Pages : 840
Book Description
Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket