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Author: Piero Pianetta Publisher: Springer ISBN: 9781563969416 Category : Medical Languages : en Pages : 520
Book Description
This conference presents invited and contributed papers by international experts devoted to explosive phenomena in cosmic settings as diverse as stellar flares, X-ray bursts, jets, novae, supernovae, hypernovae, and gamma-ray bursts. The conference considered not only the origins of explosive behavior, but also information about the host systems that the explosive phenomena might yield. For example, X-ray bursts can be used to determine structural parameters of neutron stars, and specific types of supernovae can be used as standard candles to study the deceleration of the Hubble expansion.
Author: Piero Pianetta Publisher: Springer ISBN: 9781563969416 Category : Medical Languages : en Pages : 520
Book Description
This conference presents invited and contributed papers by international experts devoted to explosive phenomena in cosmic settings as diverse as stellar flares, X-ray bursts, jets, novae, supernovae, hypernovae, and gamma-ray bursts. The conference considered not only the origins of explosive behavior, but also information about the host systems that the explosive phenomena might yield. For example, X-ray bursts can be used to determine structural parameters of neutron stars, and specific types of supernovae can be used as standard candles to study the deceleration of the Hubble expansion.
Author: Craig Hoffman Publisher: CRC Press ISBN: 1351247174 Category : Science Languages : en Pages : 3726
Book Description
The first edition of the Encyclopedia of Optical and Photonic Engineering provided a valuable reference concerning devices or systems that generate, transmit, measure, or detect light, and to a lesser degree, the basic interaction of light and matter. This Second Edition not only reflects the changes in optical and photonic engineering that have occurred since the first edition was published, but also: Boasts a wealth of new material, expanding the encyclopedia’s length by 25 percent Contains extensive updates, with significant revisions made throughout the text Features contributions from engineers and scientists leading the fields of optics and photonics today With the addition of a second editor, the Encyclopedia of Optical and Photonic Engineering, Second Edition offers a balanced and up-to-date look at the fundamentals of a diverse portfolio of technologies and discoveries in areas ranging from x-ray optics to photon entanglement and beyond. This edition’s release corresponds nicely with the United Nations General Assembly’s declaration of 2015 as the International Year of Light, working in tandem to raise awareness about light’s important role in the modern world. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Author: Optical Society of America Publisher: McGraw Hill Professional ISBN: 0071753427 Category : Technology & Engineering Languages : en Pages : 6122
Book Description
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments. Volume II covers design, fabrications, testing, sources, detectors, radiometry, and photometry. Volume III, all in full color, covers vision and vision optics. Volume IV covers optical properties of materials, nonlinear optics, and quantum optics. Volume V covers atmospheric optics, modulators, fiber optics, and x-ray and neutron optics. Visit www.HandbookofOpticsOnline.com to search all five volumes and download a comprehensive index.
Author: Ali M. Khounsary Publisher: SPIE-International Society for Optical Engineering ISBN: 9780819450661 Category : Nature Languages : en Pages : 240
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Optical Society of America Publisher: McGraw Hill Professional ISBN: 0071414789 Category : Technology & Engineering Languages : en Pages : 818
Book Description
A new volume in the field's bestselling options reference--an entirely new opus focusing on x-ray, nonlinear, and vision optics. Provides the same mix of tutorial writing with in-depth reference material that distinguished Volumes I & II.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1420051539 Category : Technology & Engineering Languages : en Pages : 866
Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author: David Attwood Publisher: Cambridge University Press ISBN: 1139643428 Category : Technology & Engineering Languages : en Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: Piero Pianetta
Author: Piero Pianetta
Author: 
Author: Ronald G. Driggers
Author: Craig Hoffman
Author: Optical Society of America
Author: 
Author: Ali M. Khounsary
Author: Optical Society of America
Author: Bruce W. Smith
Author: David Attwood