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Author: David C. Joy Publisher: Oxford University Press ISBN: 0195358465 Category : Computers Languages : en Pages : 225
Book Description
This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.
Author: David C. Joy Publisher: Oxford University Press ISBN: 0195358465 Category : Computers Languages : en Pages : 225
Book Description
This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.
Author: K.F.J. Heinrich Publisher: Springer Science & Business Media ISBN: 1489926178 Category : Science Languages : en Pages : 397
Book Description
In 1968, the National Bureau of Standards (NBS) published Special Publication 298 "Quantitative Electron Probe Microanalysis," which contained proceedings of a seminar held on the subject at NBS in the summer of 1967. This publication received wide interest that continued through the years far beyond expectations. The present volume, also the result of a gathering of international experts, in 1988, at NBS (now the National Institute of Standards and Technology, NIST), is intended to fulfill the same purpose. After years of substantial agreement on the procedures of analysis and data evaluation, several sharply differentiated approaches have developed. These are described in this publi cation with all the details required for practical application. Neither the editors nor NIST wish to endorse any single approach. Rather, we hope that their exposition will stimulate the dialogue which is a prerequisite for technical progress. Additionally, it is expected that those active in research in electron probe microanalysis will appreciate more clearly the areas in which further investigations are warranted.
Author: Weilie Zhou Publisher: Springer Science & Business Media ISBN: 0387396209 Category : Technology & Engineering Languages : en Pages : 533
Book Description
This book presents scanning electron microscopy (SEM) fundamentals and applications for nanotechnology. It includes integrated fabrication techniques using the SEM, such as e-beam and FIB, and it covers in-situ nanomanipulation of materials. The book is written by international experts from the top nano-research groups that specialize in nanomaterials characterization. The book will appeal to nanomaterials researchers, and to SEM development specialists.
Author: Joseph Goldstein Publisher: Springer Science & Business Media ISBN: 1461502152 Category : Technology & Engineering Languages : en Pages : 708
Book Description
This text provides students as well as practitioners with a comprehensive introduction to the field of scanning electron microscopy (SEM) and X-ray microanalysis. The authors emphasize the practical aspects of the techniques described. Topics discussed include user-controlled functions of scanning electron microscopes and x-ray spectrometers and the use of x-rays for qualitative and quantitative analysis. Separate chapters cover SEM sample preparation methods for hard materials, polymers, and biological specimens. In addition techniques for the elimination of charging in non-conducting specimens are detailed.
Author: Maurizio Dapor Publisher: Springer ISBN: 3540365079 Category : Science Languages : en Pages : 118
Book Description
The interaction of an electron beam with a solid target has been studied since the early part of the past century. Since 1960, the electron–solid interaction hasbecomethesubjectofanumberofinvestigators’workowingtoitsfun- mental role in scanning electron microscopy, in electron-probe microanalysis, in Auger electron spectroscopy, in electron-beam lithography and in radiation damage. The interaction of an electron beam with a solid target has often been investigated theoretically by using the Monte Carlo method, a nume- cal procedure involving random numbers that is able to solve mathematical problems. This method is very useful for the study of electron penetration in matter. The probabilistic laws of the interaction of an individual electron with the atoms constituting the target are well known. Consequently, it is possible to compute the macroscopic characteristics of interaction processes by simulating a large number of real trajectories, and then averaging them. The aim of this book is to study the probabilistic laws of the interaction of individual electrons with atoms (elastic and inelastic cross-sections); to - vestigate selected aspects of electron interaction with matter (backscattering coe?cients for bulk targets, absorption, backscattering and transmission for both supported and unsupported thin ?lms, implantation pro?les, seconda- electron emission, and so on); and to introduce the Monte Carlo method and its applications to compute the macroscopic characteristics of the inter- tion processes mentioned above. The book compares theory, computational simulations and experimental data in order to o?er a more global vision.
Author: Ludwig Reimer Publisher: Springer ISBN: 3540389679 Category : Science Languages : en Pages : 538
Book Description
Scanning Electron Microscopy provides a description of the physics of electron-probe formation and of electron-specimen interactions. The different imaging and analytical modes using secondary and backscattered electrons, electron-beam-induced currents, X-ray and Auger electrons, electron channelling effects, and cathodoluminescence are discussed to evaluate specific contrasts and to obtain quantitative information.
Author: David C. Joy
Author: David C. Joy
Author: Kurt F. J. Heinrich
Author: 
Author: K.F.J. Heinrich
Author: Frances M. Ross
Author: Weilie Zhou
Author: Joseph Goldstein
Author: Maurizio Dapor
Author: Ludwig Reimer
Author: Victor D. Scott