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Author: Cheol Seong Hwang Publisher: Springer Science & Business Media ISBN: 146148054X Category : Science Languages : en Pages : 266
Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Theodor Schneller Publisher: Springer Science & Business Media ISBN: 3211993118 Category : Technology & Engineering Languages : en Pages : 801
Book Description
This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
Author: Pietro Mandracci Publisher: BoD – Books on Demand ISBN: 1789849608 Category : Technology & Engineering Languages : en Pages : 166
Book Description
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Author: Niladri Pratap Maity Publisher: CRC Press ISBN: 1000527441 Category : Science Languages : en Pages : 248
Book Description
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.
Author: Allen W. Apblett Publisher: Elsevier ISBN: 0128203447 Category : Technology & Engineering Languages : en Pages : 630
Book Description
Nanomaterials via Single-Source Precursors: Synthesis, Processing and Applications presents recent results and overviews of synthesis, processing, characterization and applications of advanced materials for energy, electronics, biomedicine, sensors and aerospace. A variety of processing methods (vapor, liquid and solid-state) are covered, along with materials, including metals, oxides, semiconductor, sulfides, selenides, nitrides, and carbon-based materials. Production of quantum dots, nanoparticles, thin films and composites are described by a collection of international experts. Given the ability to customize the phase, morphology, and properties of target materials, this "rational approach to synthesis and processing is a disruptive technology for electronic, energy, structural and biomedical (nano)materials and devices. The use of single-source chemical precursors for materials processing technology allows for intimate elemental mixing and hence production of complex materials at temperatures well below traditional physical methods and those involving direct combination of elements. The use of lower temperatures enables thin-film deposition on lightweight polymer substrates and reduces damage to complex devices structures such as used in power, electronics and sensors. - Discusses new approaches to synthesis or single-source precursors (SSPs) and the concept of rational design of materials - Includes materials processing of SSPs in the design of new materials and novel devices - Provides comprehensive coverage of the subject (materials science and chemistry) as related to SSPs and the range of potential applications
Author: Selcan Karakuş Publisher: BoD – Books on Demand ISBN: 1838800018 Category : Science Languages : en Pages : 162
Book Description
This book was written by authors in the field of ultrasound-assited synthesis and their applications. Among others, some of the topics covered are: ultrasound-assited synthesis of metal/metal oxide nanoparticles, graphene nanosheets, and ultrasound applications. In this book, authors focused on recent studies, applications, and new technological developments on fundamental properties of the ultrasound process.
Author: Hartmut Frey Publisher: Springer Science & Business Media ISBN: 3642054307 Category : Technology & Engineering Languages : en Pages : 385
Book Description
“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.
Author: A.D. Pomogailo Publisher: Springer Science & Business Media ISBN: 3540265236 Category : Technology & Engineering Languages : en Pages : 577
Book Description
This book presents and analyzes the essential data on nanoscale metal clusters dispersed in, or chemically bonded with polymers. Special attention is paid to the in situ synthesis of the nanocomposites, their chemical interactions, and the size and distribution of the particles in the polymer matrix. Numerous novel nanocomposites are described with regard to their mechanical, electrophysical, optical, magnetic, catalytic and biological properties. Their applications, present and future, are outlined.
Author: David C Sherrington Publisher: Royal Society of Chemistry ISBN: 1847551963 Category : Science Languages : en Pages : 282
Book Description
The need to improve both the efficiency and environmental acceptability of industrial processes is driving the development of heterogeneous catalysts across the chemical industry, including commodity, specialty and fine chemicals and in pharmaceuticals and agrochemicals. Drawing on international research, Supported Catalysts and their Applications discusses aspects of the design, synthesis and application of solid supported reagents and catalysts, including supported reagents for multi-step organic synthesis; selectivity in oxidation catalysis; mesoporous molecular sieve catalysts; and the use of Zeolite Beta in organic reactions. In addition, the two discrete areas of heterogeneous catalysis (inorganic oxide materials and polymer-based catalysts) that were developing in parallel are now shown to be converging, which will be of great benefit to the whole field. Providing a snapshot of the state-of-the-art in this fast-moving field, this book will be welcomed by industrialists and researchers, particularly in the agrochemicals and pharmaceuticals industries.
Author: W. H. Shafer
Author: W. H. Shafer
Author: Cheol Seong Hwang
Author: Theodor Schneller
Author: Pietro Mandracci
Author: Niladri Pratap Maity
Author: Allen W. Apblett
Author: Selcan Karakuş
Author: Hartmut Frey
Author: A.D. Pomogailo
Author: David C Sherrington