Author: Scott Anderson MiddlebrooksPublisher:
ISBN:
Category :
Languages : en
Pages : 220
Book Description
Modelling and Control of Silicon and Germanium Thin Film Chemical Vapor Deposition
Author: Scott Anderson MiddlebrooksPublisher:
ISBN:
Category :
Languages : en
Pages : 220
Book Description
Silicon and Germanium Thin Film Chemical Vapor Deposition, Modeling and Control
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
From 1995-2000, researchers at The University of Texas at Austin and the University of Wisconsin, Madison investigated and demonstrated new, intelligent manufacturing processes for growing epitaxial silicon alloy thin films that employ input from in situ optical process sensors to maintain precise control of film composition and thickness. The research team accomplished what was set forth in the original proposal. Significant progress was made in understanding the fundamental chemistry and physics of thin alloy films that affects the sensor operation and growth models, in developing and implementing state estimation and model predictive control techniques, in advancing optical sensors that can provide a complete description of the film properties, and in the design and demonstration of strained SiGe/Si and SiGeC/Si heterostructures with significant device performance enhancements over Si-based devices.
Hot Wire Chemical Vapor Deposition for Silicon and Silicon-germanium Thin Films and Solar Cells
Author: L.W. VeldhuizenPublisher:
ISBN: 9789038641829
Category :
Languages : en
Pages : 144
Book Description
Modeling of Chemical Vapor Deposition of Tungsten Films
Author: Chris R. KleijnPublisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566773195
Category : Science
Languages : en
Pages : 526
Book Description
Thin Film Deposition Employing Supersonic Molecular Beams
Author: Todd William SchroederPublisher:
ISBN:
Category :
Languages : en
Pages : 660
Book Description
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Handbook of Thin Film Deposition
Author: Krishna SeshanPublisher: William Andrew
ISBN: 0128123125
Category : Technology & Engineering
Languages : en
Pages : 472
Book Description
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics
Temperature Control and Characterization of Silicon-germanium Growth by Rapid Thermal Chemical Vapor Deposition
Author: Sung-bo HwangPublisher:
ISBN:
Category : Germanium
Languages : en
Pages : 0
Book Description
Author: