Author: David Kolman
Publisher:
ISBN:
Category :
Languages : en
Pages : 280
Book Description
Modeling of Thermal Plasma Chemical Vapor Deposition of Diamond with Liquid Feedstock Injection
A model for chemical vapor deposition of diamond in a radio-frequency induction thermal plasma
Thermal Plasma Treatment of Organic Liquids
Thermal Plasma Processing of Materials
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 33
Book Description
Emphasis has been on plasma synthesis of fine powders, plasma Chemical Vapor Deposition (CVD), on related diagnostics, and on modeling work. Since plasma synthesis as well as plasma CVD make frequent use of plasma jets, the beginning has been devoted of plasma jets and behavior of particulates injected into such plasma jets. Although most of the construction of the Triple-Torch Plasma Reactor (TTPR) has already been done, modifications have been made in particular modifications required for plasma CVD of diamond. A new reactor designed for Counter-Flow Liquid Injection Plasma Synthesis (CFLIPS) proved to be an excellent tool for synthesis of fine powders as well as for plasma CVD. An attempt was made to model flow and temperature fields in this reactor. Substantial efforts were made to single out those parameters which govern particle size, size distribution, and powder quality in our plasma synthesis experiments. This knowledge is crucial for controlling the process and for meaningful diagnostics and modeling work. Plasma CVD of diamond films using both reactors has been very successful and we have been approached by a number of companies interested in using this technology for coating of tools.
Publisher:
ISBN:
Category :
Languages : en
Pages : 33
Book Description
Emphasis has been on plasma synthesis of fine powders, plasma Chemical Vapor Deposition (CVD), on related diagnostics, and on modeling work. Since plasma synthesis as well as plasma CVD make frequent use of plasma jets, the beginning has been devoted of plasma jets and behavior of particulates injected into such plasma jets. Although most of the construction of the Triple-Torch Plasma Reactor (TTPR) has already been done, modifications have been made in particular modifications required for plasma CVD of diamond. A new reactor designed for Counter-Flow Liquid Injection Plasma Synthesis (CFLIPS) proved to be an excellent tool for synthesis of fine powders as well as for plasma CVD. An attempt was made to model flow and temperature fields in this reactor. Substantial efforts were made to single out those parameters which govern particle size, size distribution, and powder quality in our plasma synthesis experiments. This knowledge is crucial for controlling the process and for meaningful diagnostics and modeling work. Plasma CVD of diamond films using both reactors has been very successful and we have been approached by a number of companies interested in using this technology for coating of tools.
Thermal Spray Fundamentals
Author: Pierre L. Fauchais
Publisher: Springer Science & Business Media
ISBN: 0387689915
Category : Technology & Engineering
Languages : en
Pages : 1587
Book Description
This book provides readers with the fundamentals necessary for understanding thermal spray technology. Coverage includes in-depth discussions of various thermal spray processes, feedstock materials, particle-jet interactions, and associated yet very critical topics: diagnostics, current and emerging applications, surface science, and pre and post-treatment. This book will serve as an invaluable resource as a textbook for graduate courses in the field and as an exhaustive reference for professionals involved in thermal spray technology.
Publisher: Springer Science & Business Media
ISBN: 0387689915
Category : Technology & Engineering
Languages : en
Pages : 1587
Book Description
This book provides readers with the fundamentals necessary for understanding thermal spray technology. Coverage includes in-depth discussions of various thermal spray processes, feedstock materials, particle-jet interactions, and associated yet very critical topics: diagnostics, current and emerging applications, surface science, and pre and post-treatment. This book will serve as an invaluable resource as a textbook for graduate courses in the field and as an exhaustive reference for professionals involved in thermal spray technology.
Aspects of DC Arcjet Thermal Plasma Chemical Vapor Deposition
Encyclopedia of Surface and Colloid Science, 2004 Update Supplement
Author: P. Somasundaran
Publisher: CRC Press
ISBN: 1482299623
Category : Science
Languages : en
Pages : 842
Book Description
Appending the Encyclopedia of Surface and Colloid Science by 42 entries as well as 3800 new citations, 1012 equations, and 485 illustrations and chemical structures, this important supplement summarizes a constellation of new theoretical and experimental findings related to chemical characterization, mechanisms, interfacial behavior, methods and mo
Publisher: CRC Press
ISBN: 1482299623
Category : Science
Languages : en
Pages : 842
Book Description
Appending the Encyclopedia of Surface and Colloid Science by 42 entries as well as 3800 new citations, 1012 equations, and 485 illustrations and chemical structures, this important supplement summarizes a constellation of new theoretical and experimental findings related to chemical characterization, mechanisms, interfacial behavior, methods and mo
A Study of Chemical Vapor Deposition Diamond Morphology
Thermal Plasma Chemical Vapor Deposition of Diamond
Author: Marcus Asmann
Publisher:
ISBN:
Category : Diamonds, Artificial
Languages : en
Pages : 236
Book Description
Publisher:
ISBN:
Category : Diamonds, Artificial
Languages : en
Pages : 236
Book Description
Encyclopedia of Surface and Colloid Science
Author: P. Somasundaran
Publisher: CRC Press
ISBN: 9780849396038
Category : Science
Languages : en
Pages : 1014
Book Description
Publisher: CRC Press
ISBN: 9780849396038
Category : Science
Languages : en
Pages : 1014
Book Description