Modeling of Thermal, Electronic, Hydrodynamic, and Dynamic Deposition Processes for Pulsed-laser Deposition of Thin Films PDF Download
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Author: Publisher: ISBN: Category : Languages : en Pages : 8
Book Description
Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of the authors combined theoretical and experimental effort, they have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser-solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamic behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.
Author: Publisher: ISBN: Category : Languages : en Pages : 8
Book Description
Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of the authors combined theoretical and experimental effort, they have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser-solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamic behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.
Author: Dale C. Jacobson Publisher: ISBN: Category : Science Languages : en Pages : 776
Book Description
Proceedings of the title symposium, held at the 1994 MRS Fall Meeting in Boston, 28 November-2 December 1994. Selected papers that were presented in both oral and poster sessions are divided into six topical groups: ion beam processing; defects and diffusion; ion-beam modification of polymers; analysis and characterization; sputtering; and laser-assisted and induced processes. Annotation copyright by Book News, Inc., Portland, OR
Author: Richard F. Haglund Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Technology & Engineering Languages : en Pages : 172
Author: Publisher: ISBN: Category : Languages : en Pages : 25
Book Description
The transport dynamics of laser-ablated neutral/plasma plumes are of significant interest for film growth by pulsed-laser deposition of materials since the magnitude and kinetic energy of the species arriving at the deposition substrate are key processing parameters. Dynamical calculations of plume propagation in vacuum and in background gas have been performed using particle-in-cell hydrodynamics, continuum gas dynamics, and scattering models. Results from these calculations are presented and compared with experimental observations.
Author: John E. Mahan Publisher: Wiley-Interscience ISBN: 9780471330011 Category : Technology & Engineering Languages : en Pages : 0
Book Description
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
Author: Vadim P. Veiko Publisher: Springer ISBN: 3319059874 Category : Science Languages : en Pages : 327
Book Description
This book covers the state of the art of laser micro- and nanotechnology. The physical fundamentals of different processes and the application are presented. The book deals with different materials like phase change and memory alloys, thin films, polymers etc. New phenomena and mechanisms of laser-matter interaction in nano-domains are explained. This book is helpful for students, postgraduates, engineers and researches working not only in the field of laser microtechnology but also in high-tech industry, like photonics, microelectronics, information technology.
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Author: Dale C. Jacobson
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Author: Richard F. Haglund
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Author: John E. Mahan
Author: Vadim P. Veiko
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