Author: Chandrasekharan Kothandaraman
Publisher:
ISBN:
Category :
Languages : en
Pages : 88
Book Description
Modeling of the Reactive Ion Etching of Gallium Arsenide Semiconductor
Author: Chandrasekharan Kothandaraman
Publisher:
ISBN:
Category :
Languages : en
Pages : 88
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 88
Book Description
Reactive Ion Etching of Gallium Arsenide and Aluminum Gallium Arsenide Using Boron Trichloride and Chlorine
Author: Douglas Ray Hendricks
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 76
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 76
Book Description
Chlorine Reactive Ion Etching of Gallium Arsenide
Author: Joseph T. Tustin
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 222
Book Description
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 222
Book Description
Comparison of SF6 and CF4 Reactive Ion Etching Induced Contamination and Damage on Gallium Arsenide
Author: Yohtz Chang
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 162
Book Description
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 162
Book Description
Selective Reactive Ion Etching of Gallium Arsenide/aluminum Gallium Arsenide in Silicon Tetrachloride/silicon Tetrafluoride Plasmas
Author: William Harris Guggina
Publisher:
ISBN:
Category :
Languages : en
Pages : 92
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 92
Book Description
Optical Spectroscopy Studies of the Reactive Ion Etching of Gallium Arsenide in Dichlorodifloromethane/oxygen/argon Discharges
Optical Spectroscopy Studies of the Reactive Ion Etching of Silicon and Gallium Arsenide in Halomethane-based Discharges
Author: Robert Edward Klinger
Publisher:
ISBN:
Category :
Languages : en
Pages : 244
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 244
Book Description
An Examination of the Damage Caused by the Reactive Ion Etching of Gallium Arsenide
A Study of Reactive Ion Etching of Gallium Arsenide in Mixtures of Methane and Hydrogen Plasmas
Deep Anisotropic Etching of Gallium Arsenide with Chlorine-based Chemistries and SU-8 Mask Using Reactive Ion Etching and High Density Inductive Coupled Plasma Etching Methods
Author: Joy Tsz-Kwan Lau
Publisher:
ISBN:
Category : Anisotropy
Languages : en
Pages : 98
Book Description
Publisher:
ISBN:
Category : Anisotropy
Languages : en
Pages : 98
Book Description