Author: Hans SöderbergPublisher:
ISBN:
Category :
Languages : en
Pages : 64
Book Description
Microstructural Characterization and Hardening Behavior of Reactive Magnetron Sputtered TiN/Si3N4 Multilayer Thin Films
Author: Hans SöderbergMicrostructural Analysis of TiN/SiN Multilayer Films Deposited with Reactive Magnetron Sputtering
Author: Protective Thin Coatings Technology
Author: Sam ZhangPublisher: CRC Press
ISBN: 1000408418
Category : Technology & Engineering
Languages : en
Pages : 375
Book Description
Hard or protective coatings are widely used in conventional and modern industries and will continue to play a key role in future manufacturing, especially in the micro and nano areas. Protective Thin Coatings Technology highlights the developments and advances in the preparation, characterization, and applications of protective micro-/nanoscaled films and coatings. This book Covers technologies for sputtering of flexible hard nanocoatings, deposition of solid lubricating films, and multilayer transition metal nitrides Describes integrated nanomechanical characterization of hard coatings, corrosion and tribo-corrosion of hard coatings, and high entropy alloy films and coatings Investigates thin films and coatings for high-temperature applications, nanocomposite coatings on magnesium alloys, and the correlation between coating properties and industrial applications Features various aspects of hard coatings, covering advanced sputtering technologies, structural characterizations, and simulations, as well as applications This first volume in the two-volume set, Protective Thin Coatings and Functional Thin Films Technology, will benefit industry professionals and researchers working in areas related to semiconductors, optoelectronics, plasma technology, solid-state energy storages, and 5G, as well as advanced students studying electrical, mechanical, chemical, and material engineering.
Metals Abstracts
Author: Ceramic Abstracts
Author: Applications of Plasma Technologies to Material Processing
Author: Giorgio SperanzaPublisher: CRC Press
ISBN: 0429559674
Category : Science
Languages : en
Pages : 72
Book Description
This book provides a survey of the latest research and developments in plasma technology. In an easy and comprehensive manner, it explores what plasma is and the technologies utilized to produce plasma. It then investigates the main applications and their benefits. Different from other books on the topic that focus on specific aspects of plasma technology, the intention is to provide an introduction to all aspects related to plasma technologies. This book will be an ideal resource for graduate students studying plasma technologies, in addition to researchers in physics, engineering, and materials science Features Accessible and easy to understand Provides simple yet exhaustive explanations of the foundations Explores the latest technologies and is filled with practical applications and case studies
Chemical Abstracts
Author: Thin Film Analysis by X-Ray Scattering
Author: Mario BirkholzPublisher: John Wiley & Sons
ISBN: 3527607048
Category : Technology & Engineering
Languages : en
Pages : 378
Book Description
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
International Aerospace Abstracts
Author: Advances in Electronics, Communication and Computing
Author: Akhtar KalamPublisher: Springer
ISBN: 9811047650
Category : Technology & Engineering
Languages : en
Pages : 808
Book Description
This book is a compilation of research work in the interdisciplinary areas of electronics, communication, and computing. This book is specifically targeted at students, research scholars and academicians. The book covers the different approaches and techniques for specific applications, such as particle-swarm optimization, Otsu’s function and harmony search optimization algorithm, triple gate silicon on insulator (SOI)MOSFET, micro-Raman and Fourier Transform Infrared Spectroscopy (FTIR) analysis, high-k dielectric gate oxide, spectrum sensing in cognitive radio, microstrip antenna, Ground-penetrating radar (GPR) with conducting surfaces, and digital image forgery detection. The contents of the book will be useful to academic and professional researchers alike.