Microstructural Analysis of TiN/SiN Multilayer Films Deposited with Reactive Magnetron Sputtering PDF Download

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Languages : en
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Author: Hans Söderberg
Publisher:
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Category :
Languages : en
Pages : 64

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Author: B. D. Sartwell
Publisher: Elsevier
ISBN: 1483274640
Category : Technology & Engineering
Languages : en
Pages : 665

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Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.

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Publisher: Academic Press
ISBN: 008054293X
Category : Science
Languages : en
Pages : 268

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This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes

Author: Akhtar Kalam
Publisher: Springer
ISBN: 9811047650
Category : Technology & Engineering
Languages : en
Pages : 808

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This book is a compilation of research work in the interdisciplinary areas of electronics, communication, and computing. This book is specifically targeted at students, research scholars and academicians. The book covers the different approaches and techniques for specific applications, such as particle-swarm optimization, Otsu’s function and harmony search optimization algorithm, triple gate silicon on insulator (SOI)MOSFET, micro-Raman and Fourier Transform Infrared Spectroscopy (FTIR) analysis, high-k dielectric gate oxide, spectrum sensing in cognitive radio, microstrip antenna, Ground-penetrating radar (GPR) with conducting surfaces, and digital image forgery detection. The contents of the book will be useful to academic and professional researchers alike.

Author: Sukumar Basu
Publisher: BoD – Books on Demand
ISBN: 1789854377
Category : Technology & Engineering
Languages : en
Pages : 274

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This book, "Multilayer Thin Films-Versatile Applications for Materials Engineering", includes thirteen chapters related to the preparations, characterizations, and applications in the modern research of materials engineering. The evaluation of nanomaterials in the form of different shapes, sizes, and volumes needed for utilization in different kinds of gadgets and devices. Since the recently developed two-dimensional carbon materials are proving to be immensely important for new configurations in the miniature scale in the modern technology, it is imperative to innovate various atomic and molecular arrangements for the modifications of structural properties. Of late, graphene and graphene-related derivatives have been proven as the most versatile two-dimensional nanomaterials with superb mechanical, electrical, electronic, optical, and magnetic properties. To understand the in-depth technology, an effort has been made to explain the basics of nano dimensional materials. The importance of nano particles in various aspects of nano technology is clearly indicated. There is more than one chapter describing the use of nanomaterials as sensors. In this volume, an effort has been made to clarify the use of such materials from non-conductor to highly conducting species. It is expected that this book will be useful to the postgraduate and research students as this is a multidisciplinary subject.

Author: Sam Zhang
Publisher: CRC Press
ISBN: 1000408418
Category : Technology & Engineering
Languages : en
Pages : 375

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Hard or protective coatings are widely used in conventional and modern industries and will continue to play a key role in future manufacturing, especially in the micro and nano areas. Protective Thin Coatings Technology highlights the developments and advances in the preparation, characterization, and applications of protective micro-/nanoscaled films and coatings. This book Covers technologies for sputtering of flexible hard nanocoatings, deposition of solid lubricating films, and multilayer transition metal nitrides Describes integrated nanomechanical characterization of hard coatings, corrosion and tribo-corrosion of hard coatings, and high entropy alloy films and coatings Investigates thin films and coatings for high-temperature applications, nanocomposite coatings on magnesium alloys, and the correlation between coating properties and industrial applications Features various aspects of hard coatings, covering advanced sputtering technologies, structural characterizations, and simulations, as well as applications This first volume in the two-volume set, Protective Thin Coatings and Functional Thin Films Technology, will benefit industry professionals and researchers working in areas related to semiconductors, optoelectronics, plasma technology, solid-state energy storages, and 5G, as well as advanced students studying electrical, mechanical, chemical, and material engineering.

Author: Alexander D. Pogrebnjak
Publisher: Springer Nature
ISBN: 9811517428
Category : Science
Languages : en
Pages : 407

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Book Description
This book presents the findings of experimental and theoretical (including first-principles molecular dynamics simulation) studies of nanostructured and nanocomposite metal-based materials, and nanoscale multilayer coatings fabricated by physical or chemical vapor deposition, magnetron sputtering, electrospark alloying, ionic layer absorption, contact melting, and high-current electron beam irradiation. It also discusses novel methods of nanocomposite formation, as well as the structure of the deposited films, coatings and other nanoscale materials, their elemental and phase composition, and their physical–mechanical, tribological, magnetic and electrical properties. Lastly, it explores the influence of a various surface modification methods, such as thermal annealing, pulsed laser modification, and thermomechanical and ultrasonic treatment, as well as different properties of nanostructured films.

Author: Yu-Hong Zhao
Publisher: Frontiers Media SA
ISBN: 2832517374
Category : Technology & Engineering
Languages : en
Pages : 126

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Author: Alexander D. Pogrebnjak
Publisher: Springer
ISBN: 9811361339
Category : Technology & Engineering
Languages : en
Pages : 380

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Book Description
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.