Author: I. WangPublisher:
ISBN:
Category :
Languages : en
Pages : 69
Book Description
Metalorganic Chemical Vapor Deposition of Aluminum Nitride and Aluminum Nitride/silicon Carbide Solid Solutions
Author: I. WangEpitaxial Growth of Layered Structures of Silicon Carbide and Aluminum Nitride by Metal-organic Chemical Vapor Deposition
Author: Bei-Shen SyweCarbide, Nitride and Boride Materials Synthesis and Processing
Author: A.W. WeimerPublisher: Springer Science & Business Media
ISBN: 9400900716
Category : Technology & Engineering
Languages : en
Pages : 675
Book Description
Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.
Metalorganic Chemical Vapor Deposition of Aluminum Nitride
Author: Herng LiuPublisher:
ISBN:
Category : Aluminum nitride
Languages : en
Pages : 392
Book Description
Scientific and Technical Aerospace Reports
Author: Metalorganic Chemical Vapor Deposition of Aluminum Nitride and Gallium Nitride
Author: Kwok-Lun HoTHE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION).
Author: JEFFREY L. DUPUIEPublisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
Preparation and Properties of Aluminum Nitride Films by Plasma-enhanced Metal-organic Chemical Vapor Deposition
Author: Chin Hsiung HoThe Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition
Author: Akhter Uddin AhmedMasters Theses in the Pure and Applied Sciences
Author: Wade H. ShaferPublisher: Springer Science & Business Media
ISBN: 1461519691
Category : Science
Languages : en
Pages : 426
Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 38 (thesis year 1993) a total of 13,787 thesis titles from 22 Canadian and 164 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 38 reports theses submitted in 1993, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.