Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 51
Book Description
The goal of the project was to develop a method to fabricate a free aluminum nitride (AlN) thin films. This was developed by growing AlN thin films on top of layered tungsten sulfide (WS2) thin films which were deposited on a mechanically rigid substrate material such as Si and Al2O3, followed by mechanical separation of AlN thin films thorough the inter-layers of WS2. This project involved the design and construction of a cold wall metal organic chemical vapor deposition (MOCVD) for WS2 thin films, and the AlN thin film deposition by atomic layer growth (ALG) process. WS2 thin films were deposited using the reaction of H2S with W(CO)6. Microstructure for WS2 thin films is generally characterized by the formation of crystallites with basal planes parallel to the interface for the first few tens of nanometers, followed by the formation of crystallites with their basal planes non-parallel to the substrate. Process conditions to grow AlN thin films via ALG using dimethylamine-alane (DMEAA) and ammonia (NH3) were investigated. Close proximity of the lattice constant of WS2 to those of AlN lead to a potential application of this materials as a substrate for subsequent growth of AlN, however, the lift-off process was severely dependent on the microstructure of WS2 interlayers.
Fabrication of AlN Thin Film Substrates by 'Van Der Waals Lift-Off Technique'
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 51
Book Description
The goal of the project was to develop a method to fabricate a free aluminum nitride (AlN) thin films. This was developed by growing AlN thin films on top of layered tungsten sulfide (WS2) thin films which were deposited on a mechanically rigid substrate material such as Si and Al2O3, followed by mechanical separation of AlN thin films thorough the inter-layers of WS2. This project involved the design and construction of a cold wall metal organic chemical vapor deposition (MOCVD) for WS2 thin films, and the AlN thin film deposition by atomic layer growth (ALG) process. WS2 thin films were deposited using the reaction of H2S with W(CO)6. Microstructure for WS2 thin films is generally characterized by the formation of crystallites with basal planes parallel to the interface for the first few tens of nanometers, followed by the formation of crystallites with their basal planes non-parallel to the substrate. Process conditions to grow AlN thin films via ALG using dimethylamine-alane (DMEAA) and ammonia (NH3) were investigated. Close proximity of the lattice constant of WS2 to those of AlN lead to a potential application of this materials as a substrate for subsequent growth of AlN, however, the lift-off process was severely dependent on the microstructure of WS2 interlayers.
Publisher:
ISBN:
Category :
Languages : en
Pages : 51
Book Description
The goal of the project was to develop a method to fabricate a free aluminum nitride (AlN) thin films. This was developed by growing AlN thin films on top of layered tungsten sulfide (WS2) thin films which were deposited on a mechanically rigid substrate material such as Si and Al2O3, followed by mechanical separation of AlN thin films thorough the inter-layers of WS2. This project involved the design and construction of a cold wall metal organic chemical vapor deposition (MOCVD) for WS2 thin films, and the AlN thin film deposition by atomic layer growth (ALG) process. WS2 thin films were deposited using the reaction of H2S with W(CO)6. Microstructure for WS2 thin films is generally characterized by the formation of crystallites with basal planes parallel to the interface for the first few tens of nanometers, followed by the formation of crystallites with their basal planes non-parallel to the substrate. Process conditions to grow AlN thin films via ALG using dimethylamine-alane (DMEAA) and ammonia (NH3) were investigated. Close proximity of the lattice constant of WS2 to those of AlN lead to a potential application of this materials as a substrate for subsequent growth of AlN, however, the lift-off process was severely dependent on the microstructure of WS2 interlayers.
Scientific and Technical Aerospace Reports
Metalorganic Chemical Vapor Deposition (MOCVD) Routes for Fabrication of Rare Earth Nitride Thin Films
Author: Michael Krasnopolski
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Dissertation Abstracts International
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 826
Book Description
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 826
Book Description
Advanced Functional Piezoelectric Materials and Applications
Author: Inamuddin
Publisher: Materials Research Forum LLC
ISBN: 1644902087
Category : Technology & Engineering
Languages : en
Pages : 290
Book Description
The book reviews our current knowledge of piezoelectric materials, including their history, developments, properties, process design, and technical applications in such areas as sensors, actuators, power sources, motors, environmental and biomedical domains. Piezoelectric materials will play a crucial role in the development of sustainable energy systems. Keywords: Piezoelectric Materials, Piezo-crystals, Nanogenerators, Phototronics, Piezoelectric Composites, Biomedical Applications, Energy Harvesting, Piezoelectric Thin Films, Piezoelectric Perovskites, Sensor Applications, Piezoelectric Ceramics, Piezoelectric Semiconductors, Piezoelectric Polymers.
Publisher: Materials Research Forum LLC
ISBN: 1644902087
Category : Technology & Engineering
Languages : en
Pages : 290
Book Description
The book reviews our current knowledge of piezoelectric materials, including their history, developments, properties, process design, and technical applications in such areas as sensors, actuators, power sources, motors, environmental and biomedical domains. Piezoelectric materials will play a crucial role in the development of sustainable energy systems. Keywords: Piezoelectric Materials, Piezo-crystals, Nanogenerators, Phototronics, Piezoelectric Composites, Biomedical Applications, Energy Harvesting, Piezoelectric Thin Films, Piezoelectric Perovskites, Sensor Applications, Piezoelectric Ceramics, Piezoelectric Semiconductors, Piezoelectric Polymers.
The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition
Characterization of the Sol-gel and MOCVD Processes for the Deposition of Aluminum Oxide Thin Films
Author: Mark Joseph Waner
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 178
Book Description
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 178
Book Description
Metal Organic Chemical Vapor Deposition (MOCVD) of Metal Thin Films
Author: Zhaofeng Wang
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 132
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 132
Book Description
Energy Research Abstracts
Handbook of Advanced Ceramics
Author:
Publisher: Academic Press
ISBN: 0123854709
Category : Technology & Engineering
Languages : en
Pages : 1259
Book Description
This new handbook will be an essential resource for ceramicists. It includes contributions from leading researchers around the world and includes sections on Basic Science of Advanced Ceramics, Functional Ceramics (electro-ceramics and optoelectro-ceramics) and engineering ceramics. - Contributions from more than 50 leading researchers from around the world - Covers basic science of advanced ceramics, functional ceramics (electro-ceramics and optoelectro-ceramics), and engineering ceramics - Approximately 750 illustrations
Publisher: Academic Press
ISBN: 0123854709
Category : Technology & Engineering
Languages : en
Pages : 1259
Book Description
This new handbook will be an essential resource for ceramicists. It includes contributions from leading researchers around the world and includes sections on Basic Science of Advanced Ceramics, Functional Ceramics (electro-ceramics and optoelectro-ceramics) and engineering ceramics. - Contributions from more than 50 leading researchers from around the world - Covers basic science of advanced ceramics, functional ceramics (electro-ceramics and optoelectro-ceramics), and engineering ceramics - Approximately 750 illustrations