Author: David L. PearsonPublisher:
ISBN:
Category :
Languages : en
Pages : 122
Book Description
Low-pressure Chemical Vapor Deposition of Silicon Nitride
Author: David L. PearsonLow Pressure Chemical Vapor Deposition of Silicon Nitride Films from Ditertiarybutylsilane
Author: Xiangqun FanPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 120
Book Description
Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Tridimethylaminosilane
Author: Xin LinPublisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 242
Book Description
Low Pressure Chemical Vapor Deposition of Polycrystalline Silicon and Silicon Nitride
Author: Sabine Le MarquisPublisher:
ISBN:
Category : Semiconductor films
Languages : en
Pages : 234
Book Description
Design and Implementation of a Low Pressure Chemical Vapor Deposition System for Polysilicon and Silicon Nitride
Author: Jianwen ZhuPublisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 172
Book Description
Characterization of Silicon Nitride Films on N-GaN Prepared by Low-Pressure Chemical Vapor Deposition
Author: 李承遠Low Pressure Chemical Vapor Deposition of Silicon Nitride and Silicon Oxynitride Layers and Their Application in Optical Waveguide Based Chemical Sensors
Author: Ahmed TamimSilicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII
![Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII PDF](https://books.google.com/books/content/images/frontcover/wUnw2OLLYf4C?fife=w80-h100)
Author: Ram Ekwal SahPublisher: The Electrochemical Society
ISBN: 9781566774598
Category : Nature
Languages : en
Pages : 606
Book Description
THE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION).
Author: JEFFREY L. DUPUIEPublisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.