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Author: Guntrade Roll Publisher: Logos Verlag Berlin GmbH ISBN: 3832532617 Category : Science Languages : en Pages : 240
Book Description
The continuous improvement in semiconductor technology requires field effect transistor scaling while maintaining acceptable leakage currents. This study analyzes the effect of scaling on the leakage current and defect distribution in peripheral DRAM transistors. The influence of important process changes, such as the high-k gate patterning and encapsulation as well as carbon co-implants in the source/drain junction are investigated by advanced electrical measurements and TCAD simulation. A complete model for the trap assisted leakage currents in the silicon bulk of the transistors is presented.
Author: Guntrade Roll Publisher: Logos Verlag Berlin GmbH ISBN: 3832532617 Category : Science Languages : en Pages : 240
Book Description
The continuous improvement in semiconductor technology requires field effect transistor scaling while maintaining acceptable leakage currents. This study analyzes the effect of scaling on the leakage current and defect distribution in peripheral DRAM transistors. The influence of important process changes, such as the high-k gate patterning and encapsulation as well as carbon co-implants in the source/drain junction are investigated by advanced electrical measurements and TCAD simulation. A complete model for the trap assisted leakage currents in the silicon bulk of the transistors is presented.
Author: Sorin Cristoloveanu Publisher: Springer Science & Business Media ISBN: 9780792395485 Category : Technology & Engineering Languages : en Pages : 414
Book Description
Silicon on Insulator is more than a technology, more than a job, and more than a venture in microelectronics; it is something different and refreshing in device physics. This book recalls the activity and enthu siasm of our SOl groups. Many contributing students have since then disappeared from the SOl horizon. Some of them believed that SOl was the great love of their scientific lives; others just considered SOl as a fantastic LEGO game for adults. We thank them all for kindly letting us imagine that we were guiding them. This book was very necessary to many people. SOl engineers will certainly be happy: indeed, if the performance of their SOl components is not always outstanding, they can now safely incriminate the relations given in the book rather than their process. Martine, Gunter, and Y. S. Chang can contemplate at last the amount of work they did with the figures. Our SOl accomplices already know how much we borrowed from their expertise and would find it indecent to have their detailed contri butions listed. Jean-Pierre and Dimitris incited the book, while sharing their experience in the reliability of floating bodies. Our families and friends now realize the SOl capability of dielectrically isolating us for about two years in a BOX. Our kids encouraged us to start writing. Our wives definitely gave us the courage to stop writing. They had a hard time fighting the symptoms of a rapidly developing SOl allergy.
Author: V. K. Jain Publisher: Springer Science & Business Media ISBN: 3319030027 Category : Science Languages : en Pages : 841
Book Description
The purpose of this workshop is to spread the vast amount of information available on semiconductor physics to every possible field throughout the scientific community. As a result, the latest findings, research and discoveries can be quickly disseminated. This workshop provides all participating research groups with an excellent platform for interaction and collaboration with other members of their respective scientific community. This workshop’s technical sessions include various current and significant topics for applications and scientific developments, including • Optoelectronics • VLSI & ULSI Technology • Photovoltaics • MEMS & Sensors • Device Modeling and Simulation • High Frequency/ Power Devices • Nanotechnology and Emerging Areas • Organic Electronics • Displays and Lighting Many eminent scientists from various national and international organizations are actively participating with their latest research works and also equally supporting this mega event by joining the various organizing committees.
Author: Juin Jei Liou Publisher: Springer Science & Business Media ISBN: 9780412146015 Category : Science Languages : en Pages : 372
Book Description
Analysis and Design of MOSFETs: Modeling, Simulation, and Parameter Extraction is the first book devoted entirely to a broad spectrum of analysis and design issues related to the semiconductor device called metal-oxide semiconductor field-effect transistor (MOSFET). These issues include MOSFET device physics, modeling, numerical simulation, and parameter extraction. The discussion of the application of device simulation to the extraction of MOSFET parameters, such as the threshold voltage, effective channel lengths, and series resistances, is of particular interest to all readers and provides a valuable learning and reference tool for students, researchers and engineers. Analysis and Design of MOSFETs: Modeling, Simulation, and Parameter Extraction, extensively referenced, and containing more than 180 illustrations, is an innovative and integral new book on MOSFETs design technology.
Author: Christian Piguet Publisher: CRC Press ISBN: 1351836609 Category : Technology & Engineering Languages : en Pages : 499
Book Description
The power consumption of microprocessors is one of the most important challenges of high-performance chips and portable devices. In chapters drawn from Piguet's recently published Low-Power Electronics Design, Low-Power CMOS Circuits: Technology, Logic Design, and CAD Tools addresses the design of low-power circuitry in deep submicron technologies. It provides a focused reference for specialists involved in designing low-power circuitry, from transistors to logic gates. The book is organized into three broad sections for convenient access. The first examines the history of low-power electronics along with a look at emerging and possible future technologies. It also considers other technologies, such as nanotechnologies and optical chips, that may be useful in designing integrated circuits. The second part explains the techniques used to reduce power consumption at low levels. These include clock gating, leakage reduction, interconnecting and communication on chips, and adiabatic circuits. The final section discusses various CAD tools for designing low-power circuits. This section includes three chapters that demonstrate the tools and low-power design issues at three major companies that produce logic synthesizers. Providing detailed examinations contributed by leading experts, Low-Power CMOS Circuits: Technology, Logic Design, and CAD Tools supplies authoritative information on how to design and model for high performance with low power consumption in modern integrated circuits. It is a must-read for anyone designing modern computers or embedded systems.
Author: Enrico Prati Publisher: CRC Press ISBN: 9814316695 Category : Science Languages : en Pages : 374
Book Description
Single-Atom Nanoelectronics covers the fabrication of single-atom devices and related technology, as well as the relevant electronic equipment and the intriguing new phenomena related to single-atom and single-electron effects in quantum devices. It also covers the alternative approaches related to both silicon- and carbon-based technologies, also
Author: Yuhua Cheng Publisher: Springer Science & Business Media ISBN: 0306470500 Category : Technology & Engineering Languages : en Pages : 467
Book Description
Circuit simulation is essential in integrated circuit design, and the accuracy of circuit simulation depends on the accuracy of the transistor model. BSIM3v3 (BSIM for Berkeley Short-channel IGFET Model) has been selected as the first MOSFET model for standardization by the Compact Model Council, a consortium of leading companies in semiconductor and design tools. In the next few years, many fabless and integrated semiconductor companies are expected to switch from dozens of other MOSFET models to BSIM3. This will require many device engineers and most circuit designers to learn the basics of BSIM3. MOSFET Modeling & BSIM3 User's Guide explains the detailed physical effects that are important in modeling MOSFETs, and presents the derivations of compact model expressions so that users can understand the physical meaning of the model equations and parameters. It is the first book devoted to BSIM3. It treats the BSIM3 model in detail as used in digital, analog and RF circuit design. It covers the complete set of models, i.e., I-V model, capacitance model, noise model, parasitics model, substrate current model, temperature effect model and non quasi-static model. MOSFET Modeling & BSIM3 User's Guide not only addresses the device modeling issues but also provides a user's guide to the device or circuit design engineers who use the BSIM3 model in digital/analog circuit design, RF modeling, statistical modeling, and technology prediction. This book is written for circuit designers and device engineers, as well as device scientists worldwide. It is also suitable as a reference for graduate courses and courses in circuit design or device modelling. Furthermore, it can be used as a textbook for industry courses devoted to BSIM3. MOSFET Modeling & BSIM3 User's Guide is comprehensive and practical. It is balanced between the background information and advanced discussion of BSIM3. It is helpful to experts and students alike.
Author: Yu Yuan Publisher: ISBN: 9781267222190 Category : Languages : en Pages : 149
Book Description
Low power and high density requires scaling of MOSFETs in VLSI. As the Si based bulk MOSFETs scale down to the limit imposed by gate oxide tunneling induced gate leakage, short channel effects (SCEs) induced loss of control on electrostatic integrity, high body doping induced high Vt variation, and band-to-band tunneling induced high substrate leakage, etc., two categories of novel MOSFETs are being intensively investigated: Si multiple gate MOSFETs and high mobility III-V material based MOSFETs. Among all types of Si multiple gate MOSFETs, nanowire MOSFET is drawing quite a few attentions for its superior electrostatic control through all-around gate structure. High mobility III-V MOSFETs are considered as a principal candidate to achieve high speed without too aggressive scaling, which can keep good control of electrostatic integrity. This dissertation is primarily devoted to modeling and characterization of challenges and features which are becoming pronounced in aggressively scaled MOSFETs and high mobility material based MOSFETs. High-k dielectric on III-V MOS capacitors are intensively characterized and modeled with the focus on defects at insulator- semiconductor interface as well as inside the oxide, which are grand challenges for III-V MOSFETs. A distributed bulk-oxide trap model is developed to account for the commonly observed frequency dispersion of small signal capacitance-voltage and conductance-voltage data in accumulation and near flat band region. The observed C-V humps in depletion to strong inversion are modeled by interface states model. For III-V MOSFETs design, SCEs and raised source/drain issues are studied using TCAD simulation. Fabricated III-V MOSFETs are characterized and mobility is extracted through experimental current voltage data and multiple frequency gate to channel capacitance measurement and data. For multiple gate Si MOSFETs, this dissertation focuses on nanowire MOSFETs. SCEs based on generalized scale length theory are discussed and compact models are proposed and validated by TCAD simulation. Quantum confinement effects on Vt shift in nanowire MOSFETs with anisotropic effective mass are modeled. Scaling limit is projected for extremely scaled nanowire MOSFETs based on Vt shift sensitivity and scale length theory. Finally, inversion layer capacitance beyond the conventional bulk Si-based MOSFETs is investigated for III-V MOSFETs as well as two typical 3-D transistors, namely symmetric double-gate MOSFETs and nanowire MOSFETs.
Author: Tibor Grasser Publisher: Springer Nature ISBN: 3030375005 Category : Technology & Engineering Languages : en Pages : 724
Book Description
This book summarizes the state-of-the-art, regarding noise in nanometer semiconductor devices. Readers will benefit from this leading-edge research, aimed at increasing reliability based on physical microscopic models. Authors discuss the most recent developments in the understanding of point defects, e.g. via ab initio calculations or intricate measurements, which have paved the way to more physics-based noise models which are applicable to a wider range of materials and features, e.g. III-V materials, 2D materials, and multi-state defects. Describes the state-of-the-art, regarding noise in nanometer semiconductor devices; Enables readers to design more reliable semiconductor devices; Offers the most up-to-date information on point defects, based on physical microscopic models.
Author: Guntrade Roll
Author: Guntrade Roll
Author: Sorin Cristoloveanu
Author: V. K. Jain
Author: Baqir Hussain
Author: Juin Jei Liou
Author: Christian Piguet
Author: Enrico Prati
Author: Yuhua Cheng
Author: Yu Yuan
Author: Tibor Grasser