Author: Elizabeth Larson CranePublisher:
ISBN:
Category :
Languages : en
Pages : 336
Book Description
Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces
Author: Elizabeth Larson CranePublisher:
ISBN:
Category :
Languages : en
Pages : 336
Book Description
New Strategy for Mechanistic Studies of Chemical Vapor Deposition Processes Under UHV Conditions
Author: Theodor WeissFundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566773195
Category : Science
Languages : en
Pages : 526
Book Description
Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films from Organometallic Precursors
Author: Jinwoo CheonThe Chemistry of Metal CVD
Author: Toivo T. KodasPublisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Chemical Vapor Deposition
Author: Jong-Hee ParkPublisher: ASM International
ISBN: 161503224X
Category : Technology & Engineering
Languages : en
Pages : 477
Book Description
Mechanistic Studies of Organometallic Chemical Vapor Deposition of Metal Thin Films
Author: Michael Yingmin WeiPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 132
Book Description
Chemical Vapor Deposition
Author: Srinivasan SivaramPublisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
New Strategy for Mechanistic Studies of Chemical Vapor Deposition Processes Under UHV Conditions
Author: Precursor Chemistry of Advanced Materials
Author: Roland A. FischerPublisher: Springer Science & Business Media
ISBN: 9783540016052
Category : Science
Languages : en
Pages : 240
Book Description
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.