Ionized-Cluster Beam Deposition and Epitaxy PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Ionized-Cluster Beam Deposition and Epitaxy PDF full book. Access full book title Ionized-Cluster Beam Deposition and Epitaxy by Toshinori Takagi. Download full books in PDF and EPUB format.
Author: Toshinori Takagi Publisher: Univ. Press of Mississippi ISBN: 9780815511687 Category : Technology & Engineering Languages : en Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Author: Toshinori Takagi Publisher: Univ. Press of Mississippi ISBN: 9780815511687 Category : Technology & Engineering Languages : en Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Author: Ghulum Bakiri Publisher: ISBN: Category : Organogallium compounds Languages : en Pages : 242
Book Description
An experimental Ionized Cluster Beam System similar in design to the one developed at Kyoto University in Japan was. designed and constructed in the Microelectronics Laboratory at NJIT. This involved making the working drawings, having the parts machined and then assembling the system in a vacuum system together with the necessary variable power supplies, meters, controls, gas inlets, cooling water connections, etc. Eleven deposition runs were then attempted to grow gallium nitride utilizing the system constructed. In a typical deposition run, gallium was vaporized from a boron nitride crucible at 1000° C and allowed to expand through a 0.5 mm nozzle into a low pressure region containing nitrogen at 1-5 X 10−4 torr in order to form clusters of about 1000 atoms each. The gallium clusters were ionized by an electron source (300 mA) and deposited on heated quartz substrates (550° C) for reactive growth with nitrogen. For the above deposition conditions, the film growth rate was only 1 A°/min and the films were highly insulating. Photoluminescence measurements and surface analysis of the grown films revealed boron contaimination which was then traced to water vapor contamination of the boron nitride crucible and heater. The water vapor if not driven out by pre-heating the crucible in an oven, caused the boron nitride to decompose at elevated temperatures introducing reactive contaminants at the substrate surface. Further experiments showed that for GaN deposition rates greater, than 1 A° /min (and up to 1 A° /sec) 0 the crucible temperature should be at least 1100° C but preferably around 1400° C.
Author: E. Kasper Publisher: CRC Press ISBN: 1351093525 Category : Technology & Engineering Languages : en Pages : 411
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Author: James K. Hirvonen Publisher: ISBN: Category : Languages : en Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.
Author: Toshinori Takagi
Author: Toshinori Takagi
Author: Hiroshi Takaoka
Author: Ghulum Bakiri
Author: E. Kasper
Author: Jo Stephen Major
Author: Steven K. Krommenhoek
Author: Jyh Sheen
Author: Martin James Fornek
Author: James K. Hirvonen
Author: Mark Jay Jarrett