Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 836
Book Description
Scientific and Technical Aerospace Reports
Research in Progress
'Cluster Beam' and Partially Ionized Beam Deposition
Government Reports Announcements & Index
National Telesystems Conference Proceedings
Author:
Publisher:
ISBN:
Category : Data transmission systems
Languages : en
Pages : 378
Book Description
Publisher:
ISBN:
Category : Data transmission systems
Languages : en
Pages : 378
Book Description
NTC-92, National Telesystems Conference, May 19-20, 1992, George Washington University, Virginia Campus, Washington, D.C.
Author:
Publisher: Institute of Electrical & Electronics Engineers(IEEE)
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 376
Book Description
Publisher: Institute of Electrical & Electronics Engineers(IEEE)
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 376
Book Description
Optics Education
Ionized-Cluster Beam Deposition and Epitaxy
Author: Toshinori Takagi
Publisher: Univ. Press of Mississippi
ISBN: 9780815511687
Category : Technology & Engineering
Languages : en
Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Publisher: Univ. Press of Mississippi
ISBN: 9780815511687
Category : Technology & Engineering
Languages : en
Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Optical Engineering
Ion Beam-Enhanced Deposition and Ionized Cluster Beam Deposition
Author: James K. Hirvonen
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.