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Author: Toshinori Takagi Publisher: Univ. Press of Mississippi ISBN: 9780815511687 Category : Technology & Engineering Languages : en Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Author: Toshinori Takagi Publisher: Univ. Press of Mississippi ISBN: 9780815511687 Category : Technology & Engineering Languages : en Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Author: Ghulum Bakiri Publisher: ISBN: Category : Organogallium compounds Languages : en Pages : 242
Book Description
An experimental Ionized Cluster Beam System similar in design to the one developed at Kyoto University in Japan was. designed and constructed in the Microelectronics Laboratory at NJIT. This involved making the working drawings, having the parts machined and then assembling the system in a vacuum system together with the necessary variable power supplies, meters, controls, gas inlets, cooling water connections, etc. Eleven deposition runs were then attempted to grow gallium nitride utilizing the system constructed. In a typical deposition run, gallium was vaporized from a boron nitride crucible at 1000° C and allowed to expand through a 0.5 mm nozzle into a low pressure region containing nitrogen at 1-5 X 10−4 torr in order to form clusters of about 1000 atoms each. The gallium clusters were ionized by an electron source (300 mA) and deposited on heated quartz substrates (550° C) for reactive growth with nitrogen. For the above deposition conditions, the film growth rate was only 1 A°/min and the films were highly insulating. Photoluminescence measurements and surface analysis of the grown films revealed boron contaimination which was then traced to water vapor contamination of the boron nitride crucible and heater. The water vapor if not driven out by pre-heating the crucible in an oven, caused the boron nitride to decompose at elevated temperatures introducing reactive contaminants at the substrate surface. Further experiments showed that for GaN deposition rates greater, than 1 A° /min (and up to 1 A° /sec) 0 the crucible temperature should be at least 1100° C but preferably around 1400° C.
Author: Takashi Hariu Publisher: World Scientific ISBN: 9789971508395 Category : Technology & Engineering Languages : en Pages : 356
Book Description
Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Author: E. Kasper Publisher: CRC Press ISBN: 1351093525 Category : Technology & Engineering Languages : en Pages : 411
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Author: Publisher: ISBN: Category : Languages : en Pages : 21
Book Description
Our multidisciplinary research efforts over the last few years have been focused on the preparation and characterization of high quality, thermally stable thin film that exhibit high nonlinear optical properties using vacuum vapor deposition and in-situ poling (ionized cluster beam/partially ionized beam (PIB) deposition) techniques. The project's primary accomplishments are the vapor deposition of oriented organic thin films and polymer-chromophore complexes, and the development of novel nonlinear optical materials systems, such as side-chain polymers and particle-polymer complexes. Highlights of the research are as follows: (1) Organic crystals called DAST with the highest known nonlinearity have been grown and characterized; (2) PIB deposited highly transparent MNA films on FM substrates demonstrate a large second harmonic generation (SHG) signal; (3) Vapor deposited chromophore-polymer composite thin films show large EO effect (several pm/V); (4) Seven synthetic diol and triol chromophores developed have been copolymerized into polyurethane cross-linked EO polymer; (5) Vapor deposited polyurethane based side-chain polymeric thin film demonstrate large EO effects with r33 = 5.6 pm/V; (6) Spin-coated BaTiO3/PMMA composite thin film show large electrooptical effect; (7) Two novel techniques, electrooptical characterization and subpicosecond optical rectification, have been implemented.
Author: Isao Yamada Publisher: CRC Press ISBN: 1498711766 Category : Science Languages : en Pages : 260
Book Description
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Author: Toshinori Takagi
Author: Toshinori Takagi
Author: Hiroshi Takaoka
Author: Martin James Fornek
Author: Ghulum Bakiri
Author: Jo Stephen Major
Author: Mark Jay Jarrett
Author: Takashi Hariu
Author: E. Kasper
Author: 
Author: Isao Yamada