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Author: James K. Hirvonen Publisher: ISBN: Category : Languages : en Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.
Author: James K. Hirvonen Publisher: ISBN: Category : Languages : en Pages : 5
Book Description
Ion beam-enhanced deposition, presentation included conventional coating processes, ion implantation, controllable stoichiometry, superior adhesion, high-density coatings, low-temperature processing, wear, corrosion-resistant coatings, and ionized custer beam deposition.
Author: Toshinori Takagi Publisher: Univ. Press of Mississippi ISBN: 9780815511687 Category : Technology & Engineering Languages : en Pages : 244
Book Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Author: Jerome J. Cuomo Publisher: William Andrew ISBN: Category : Science Languages : en Pages : 464
Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Author: Publisher: ISBN: Category : Languages : en Pages : 21
Book Description
Our multidisciplinary research efforts over the last few years have been focused on the preparation and characterization of high quality, thermally stable thin film that exhibit high nonlinear optical properties using vacuum vapor deposition and in-situ poling (ionized cluster beam/partially ionized beam (PIB) deposition) techniques. The project's primary accomplishments are the vapor deposition of oriented organic thin films and polymer-chromophore complexes, and the development of novel nonlinear optical materials systems, such as side-chain polymers and particle-polymer complexes. Highlights of the research are as follows: (1) Organic crystals called DAST with the highest known nonlinearity have been grown and characterized; (2) PIB deposited highly transparent MNA films on FM substrates demonstrate a large second harmonic generation (SHG) signal; (3) Vapor deposited chromophore-polymer composite thin films show large EO effect (several pm/V); (4) Seven synthetic diol and triol chromophores developed have been copolymerized into polyurethane cross-linked EO polymer; (5) Vapor deposited polyurethane based side-chain polymeric thin film demonstrate large EO effects with r33 = 5.6 pm/V; (6) Spin-coated BaTiO3/PMMA composite thin film show large electrooptical effect; (7) Two novel techniques, electrooptical characterization and subpicosecond optical rectification, have been implemented.
Author: P.L.F. Hemment Publisher: Newnes ISBN: 0444596313 Category : Technology & Engineering Languages : en Pages : 630
Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Author: Isao Yamada Publisher: CRC Press ISBN: 1498711766 Category : Science Languages : en Pages : 260
Book Description
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Author: Publisher: ISBN: Category : Languages : en Pages : 27
Book Description
Ion beam-surface interactions produce many effects in thin film deposition which are similar to those encountered in plasma deposition processes. However, because of the lower pressures and higher directionality associated with the ion beam process, it is easier to avoid some sources of film contamination and to provide better control of ion energies and fluxes. Additional effects occur in the ion beam process because of the relatively small degree of thermalization resulting from gas phase collisions with both the ion beam and atoms sputtered from the target. These effects may be either beneficial or detrimental to the film properties, depending on the material and deposition conditions. Ion beam deposition is particularly suited to the deposition of multi-component films and layered structures, and can in principle be extended to a complete device fabrication process. However, complex phenomena occur in the deposition of many materials of high technical interest which make it desirable to monitor the film growth at the monolayer level. It is possible to make use of ion-surface interactions to provide a full suite of surface analytical capabilities in one instrument, and this data may be obtained at ambient pressures which are far too high for conventional surface analysis techniques. Such an instrument is under development and its current performance characteristics and anticipated capabilities are described.
Author: D. M. Mattox Publisher: Cambridge University Press ISBN: 0080946585 Category : Technology & Engineering Languages : en Pages : 947
Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author: James K. Hirvonen
Author: James K. Hirvonen
Author: Toshinori Takagi
Author: Jerome J. Cuomo
Author: 
Author: P.L.F. Hemment
Author: Isao Yamada
Author: Shih-ning Yang
Author: 
Author: Steven K. Krommenhoek
Author: D. M. Mattox