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Author: T. Itoh Publisher: Elsevier ISBN: 0444599088 Category : Science Languages : en Pages : 458
Book Description
This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.
Author: T. Itoh Publisher: Elsevier ISBN: 0444599088 Category : Science Languages : en Pages : 458
Book Description
This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.
Author: Agustin Gonzalez-elipe Publisher: World Scientific ISBN: 1783261048 Category : Science Languages : en Pages : 299
Book Description
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Author: Jerome J. Cuomo Publisher: William Andrew ISBN: Category : Science Languages : en Pages : 464
Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Author: Publisher: ISBN: Category : Languages : en Pages : 4
Book Description
The goal of this project was to lower the substrate temperature required to promote device quality epitaxial silicon growth below the 300 deg C mark set by a Japanese group led by T. Ohmi. Normally high substrate temperatures are required to achieve thin film epitaxial growth. A new thin film deposition technique called ion beam assisted deposition offers the possibility to grow epitaxial layers at low substrate temperatures. In this technique, while the atoms are condensing into the epilayer, they are bombarded by low energy noble gas ions. The kinetic energy of the incident ions supplants the thermal energy lost by lowering the substrate temperature and provides enough surface mobility so that the correct crystal structure can grow. Lower temperatures will reduce impurity and interlayer diffusion problems caused by high temperature growth processing steps.
Book Description
Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
Author: Publisher: ISBN: Category : Languages : en Pages : 3
Book Description
Energetic ions or neutrals (in the hyperthermal energy range) have been used in a number of thin film growth applications (e.g., sputtering and plasma deposition techniques, direct ion beam and ion-assisted deposition, etc.) . These involve both direct deposition of the film species with an ion beam, and deposition by some other method during simultaneous ion bombardment. Experiments and simulations have shown that energetic ions can lower the substrate temperature required to achieve crystallinity, can change growth morphologies, and influence structure and crystallographic orientation in the film. In many cases, the mechanisms responsible for ion-induced modification of growth are not understood at the atomic level. We have initiated both scattering and scanning tunneling microscopy (STM) studies to probe these mechanism's.
Author: T. Itoh
Author: T. Itoh
Author: Agustin Gonzalez-elipe
Author: Michael Nastasi
Author: James Karsten Hirvonen
Author: Jerome J. Cuomo
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Author: Bentao Cui
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Author: André Anders
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