Ion and Neutral Energy Distributions in Multifrequency Capacitive Discharges PDF Download

Author: Alan Chung Fai Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 234

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Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 1394245378
Category : Technology & Engineering
Languages : en
Pages : 837

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Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.

Author:
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ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 850

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ISBN:
Category : Aeronautics
Languages : en
Pages : 984

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Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author:
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 282

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Author: Pascal Chabert
Publisher: Cambridge University Press
ISBN: 9780521763004
Category : Science
Languages : en
Pages : 392

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Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

Author: Riccardo d'Agostino
Publisher: John Wiley & Sons
ISBN: 3527622195
Category : Science
Languages : en
Pages : 479

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Book Description
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.

Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1420012274
Category : Science
Languages : en
Pages : 355

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Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,

Author: Jürgen H Gross
Publisher: Springer Science & Business Media
ISBN: 3540407391
Category : Science
Languages : en
Pages : 534

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Book Description
Mass Spectrometry is an ideal textbook for students and professionals as well as newcomers to the field. Starting from the very first principles of gas-phase ion chemistry and isotopic properties, the textbook takes the reader through the design of mass analyzers and ionization methods all the way to mass spectral interpretation and coupling techniques. Step-by-step, the reader learns how mass spectrometry works and what it can do. The book comprises a balanced mixture of practice-oriented information and theoretical background. It features a clear layout and a wealth of high-quality figures. Exercises and solutions are located on the Springer Global Web.