Author: Blake B. RicePublisher:
ISBN:
Category :
Languages : en
Pages : 328
Book Description
Inductively Coupled Plasma Etching of Silicon and Gallium Arsenide
Author: Blake B. RiceInductively Coupled Plasma Reactive Ion Etching (ICP-RIE): Nanofabrication Tool for High Resolution Pattern Transfer
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
High resolution lithography and directional ion etching are increasingly important for the fabrication of nanostructures. As part of this equipment proposal, a reactive ion etching system was purchased from Oxford Instruments for $305,000. The Army Research Office provided $274,000, and Caltech cost share amounted to $31,500. This instrument was connected and etching conditions were optimized for the fabrication of nanostructures in silicon, silicon dioxide and gallium arsenide. In this final progress report, we will present some examples of functional devices which have been defined by using this very capable ion etching system.
Inductively Coupled Plasma Etching of III-N Semiconductors
Author: Scott Alan SmithPublisher:
ISBN:
Category :
Languages : en
Pages : 148
Book Description
Keywords: semiconductor, Gallium Nitride, GaN, etching, ICP.
Deep Anisotropic Etching of Gallium Arsenide with Chlorine-based Chemistries and SU-8 Mask Using Reactive Ion Etching and High Density Inductive Coupled Plasma Etching Methods
Author: Joy Tsz-Kwan LauPublisher:
ISBN:
Category : Anisotropy
Languages : en
Pages : 98
Book Description
Inductively Coupled Plasma Etching of Silicon
Author: Xinhai XuChemical Abstracts
Author: Selective Reactive Ion Etching of Gallium Arsenide/aluminum Gallium Arsenide in Silicon Tetrachloride/silicon Tetrafluoride Plasmas
Author: William Harris GugginaPublisher:
ISBN:
Category :
Languages : en
Pages : 92
Book Description
GaN and Related Materials
Author: Stephen J. PeartonPublisher: CRC Press
ISBN: 1000448428
Category : Science
Languages : en
Pages : 556
Book Description
Presents views on current developments in heat and mass transfer research related to the modern development of heat exchangers. Devotes special attention to the different modes of heat and mass transfer mechanisms in relation to the new development of heat exchangers design. Dedicates particular attention to the future needs and demands for further development in heat and mass transfer. GaN and related materials are attracting tremendous interest for their applications to high-density optical data storage, blue/green diode lasers and LEDs, high-temperature electronics for high-power microwave applications, electronics for aerospace and automobiles, and stable passivation films for semiconductors. In addition, there is great scientific interest in the nitrides, because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. This series provides a forum for the latest research in this rapidly-changing field, offering readers a basic understanding of new developments in recent research. Series volumes feature a balance between original theoretical and experimental research in basic physics, device physics, novel materials and quantum structures, processing, and systems.
Microoptics and Nanooptics Fabrication
Author: Shanalyn KemmePublisher: CRC Press
ISBN: 1420019147
Category : Technology & Engineering
Languages : en
Pages : 232
Book Description
The deep interconnection between micro/nanooptical components and related fabrication technologies—and the constant changes in this ever-evolving field—means that successful design depends on the engineer’s ability to accommodate cutting-edge theoretical developments in fabrication techniques and experimental realization. Documenting the state of the art in fabrication processes, Microoptics and Nanooptics Fabrication provides an up-to-date synopsis of recent breakthroughs in micro- and nanooptics that improve key developmental processes. This text elucidates the precise and miniaturized scale of today’s fabrication methods and their importance in creating new optical components to access the spectrum of physical optics. It details successful fabrication techniques and their direct effect on the intended performance of micro- and nanooptical components. The contributors explore the constraints related to material selection, component lateral extent, minimum feature size, and other issues that cause fabrication techniques to lag behind corresponding theory in the development process. Written with the professional optical engineer in mind, this book omits the already well-published broader processing fundamentals. Instead it focuses on key tricks of the trade helpful in reformulating processes to achieve necessary optical targets, improve process fidelity, and reduce production costs. The contributing authors represent the vanguard in micro-optical fabrication. The result of their combined efforts, this searing analysis of emerging fabrication technologies will continue to fuel the expansion of optics components, from the microwave to the infrared through the visible regime.
Selective Reactive Ion Etching in Silicon Tetrachloride/silicon Tetrafluoride Plasmas for Gate Recess in Gallium Arsenide-based MODFET Fabrication
Author: Daniel Gerard BallegeerPublisher:
ISBN:
Category :
Languages : en
Pages : 120
Book Description