Author: Evan L. Morrison
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 272
Book Description
Design and Implementation of a Hot Filament Chemical Vapor Deposition System for Diamond Films
Author: Evan L. Morrison
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 272
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 272
Book Description
Hot Filament Assisted Chemical Vapor Deposition and Characterization of Diamond Films
Author: Suzette Renae Burckhard
Publisher:
ISBN:
Category :
Languages : en
Pages : 170
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 170
Book Description
Hot-filament Chemical Vapor Deposition of Selectively Deposited Diamond and Silicone Thin Films
Hot Filament Activated Chemical Vapor Deposition of Nitride and Carbide Thin Films
Author: Sadanand Vinayak Deshpande
Publisher:
ISBN:
Category :
Languages : en
Pages : 302
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 302
Book Description
Hot-filament Chemical Vapor Deposition Chamber and Process with Multiple Gas Inlets
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.
Studies of Diamond Thin Film Synthesis by Hot-filament Chemical Vapor Deposition
Author: Juan A. González Sánchez
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 146
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 146
Book Description
Chemical Vapor Deposition
Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Hot-Filament Chemical Vapor Deposition
Author: Shashi K. Murthy
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages :
Book Description
Chemical Vapor Deposition of Diamond in a Rotating Substrate Hot-filament Reactor
Author: Christopher Steven Kovach
Publisher:
ISBN:
Category :
Languages : en
Pages : 490
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 490
Book Description