Handbook of Vacuum Science and Technology (HB) PDF Download

Author: Hoffman
Publisher:
ISBN: 9788181479853
Category :
Languages : en
Pages :

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Author: Dorothy Hoffman
Publisher: Elsevier
ISBN: 0080533752
Category : Science
Languages : en
Pages : 861

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Book Description
The Handbook of Vacuum Technology consists of the latest innovations in vacuum science and technology with a strong orientation towards the vacuum practitioner. It covers many of the new vacuum pumps, materials, equipment, and applications. It also details the design and maintenance of modern vacuum systems. The authors are well known experts in their individual fields with the emphasis on performance, limitations, and applications rather than theory. There aremany useful tables, charts, and figures that will be of use to the practitioner. - User oriented with many useful tables, charts, and figures of use to the practitioner - Reviews new vacuum materials and equipment - Illustrates the design and maintenance of modern vacuum systems - Includes well referenced chapters

Author: Igor Bello
Publisher: CRC Press
ISBN: 1498782051
Category : Technology & Engineering
Languages : en
Pages : 1036

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Book Description
Vacuum technology has enormous impact on human life in many aspects and fields, such as metallurgy, material development and production, food and electronic industry, microelectronics, device fabrication, physics, materials science, space science, engineering, chemistry, technology of low temperature, pharmaceutical industry, and biology. All decorative coatings used in jewelries and various daily products—including shiny decorative papers, the surface finish of watches, and light fixtures—are made using vacuum technological processes. Vacuum analytical techniques and vacuum technologies are pillars of the technological processes, material synthesis, deposition, and material analyses—all of which are used in the development of novel materials, increasing the value of industrial products, controlling the technological processes, and ensuring the high product quality. Based on physical models and calculated examples, the book provides a deeper look inside the vacuum physics and technology.

Author: John F. O'Hanlon
Publisher: John Wiley & Sons
ISBN: 1394174136
Category : Technology & Engineering
Languages : en
Pages : 580

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Book Description
A USERS GUIDE TO VACUUM TECHNOLOGY Choose and understand the vacuum technology that fits your project’s needs with this indispensable guide Vacuum technology is used to provide process environments for other kinds of engineering technology, making it an unsung cornerstone of hundreds of projects incorporating analysis, research and development, manufacturing, and more. Since it is very often a secondary technology, users primarily interested in processes incorporating it will frequently only encounter vacuum technology when purchasing or troubleshooting. There is an urgent need for a guide to vacuum technology made with these users in mind. For decades, A User’s Guide to Vacuum Technology has met this need, with a user-focused introduction to vacuum technology as it is incorporated into semiconductor, optics, solar sell, and other engineering processes. With an emphasis on otherwise neglected subjects and on accessibility to the secondary user of vacuum technology, it balances treatment of older systems that are still in use with a survey of the latest cutting-edge technologies. The result promises to continue as the essential guide to vacuum systems. Readers of the fourth edition of A User’s Guide to Vacuum Technology will also find: Expanded treatment of gauges, pumps, materials, systems, and best??operating practices Detailed discussion of cutting-edge topics like ultraclean vacuum and contamination control An authorial team with decades of combined research and engineering experience A User’s Guide to Vacuum Technology is essential for those entering emerging STEM programs, engineering professionals and graduate students working with a huge range of engineering technologies.

Author: Hadis Morkoç
Publisher: John Wiley & Sons
ISBN: 3527628428
Category : Technology & Engineering
Languages : en
Pages : 883

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Book Description
The three volumes of this handbook treat the fundamentals, technology and nanotechnology of nitride semiconductors with an extraordinary clarity and depth. They present all the necessary basics of semiconductor and device physics and engineering together with an extensive reference section. Volume 2 addresses the electrical and optical properties of nitride materials. It includes semiconductor metal contacts, impurity and carrier concentrations, and carrier transport in semiconductors.

Author: Balaji Sitharaman
Publisher: CRC Press
ISBN: 142009467X
Category : Medical
Languages : en
Pages : 734

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Book Description
Nanobiomaterials exhibit distinctive characteristics, including mechanical, electrical, and optical properties, which make them suitable for a variety of biological applications. Because of their versatility, they are poised to play a central role in nanobiotechnology and make significant contributions to biomedical research and healthcare. Nanobio

Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932

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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Author: Hadis Morkoç
Publisher: John Wiley & Sons
ISBN: 3527628460
Category : Technology & Engineering
Languages : en
Pages : 1311

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Book Description
The three volumes of this handbook treat the fundamentals, technology and nanotechnology of nitride semiconductors with an extraordinary clarity and depth. They present all the necessary basics of semiconductor and device physics and engineering together with an extensive reference section. Volume 1 deals with the properties and growth of GaN. The deposition methods considered are: hydride VPE, organometallic CVD, MBE, and liquid/high pressure growth. Additionally, extended defects and their electrical nature, point defects, and doping are reviewed.

Author: John F. O'Hanlon
Publisher: John Wiley & Sons
ISBN: 9780471270522
Category : Science
Languages : en
Pages : 538

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Book Description
In the decade and a half since the publication of the Second Edition of A User?s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today?s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User?s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.

Author: John F. McGilp
Publisher: Springer Science & Business Media
ISBN: 3642798209
Category : Computers
Languages : en
Pages : 235

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Book Description
The study of condensed matter using optical techniques, where photons act as both probe and signal, has a long history. It is only recently, however, that the extraction of surface and interface information, with submonolayer resolution, has been shown to be possible using optical techniques (where "optical" applies to electromagnetic radiation in and around the visible region of the spectrum). This book describes these "epioptic" techniques, which have now been quite widely applied to semiconductor surfaces and interfaces. Particular emphasis in the book is placed on recent studies of submonolayer growth on well-characterised semiconductor surfaces, many of which have arisen from CEC DGJGII ESPRIT Basic Research Action No. 3177 "EPIOPTIC", and CEU DGIII ESPRIT Basic Research Action No. 6878 "EASI". Techniques using other areas of the spectrum such as the infra-red region (IR spectroscopy, in its various surface configurations), and the x-ray region (surface x-ray diffraction, x-ray standing wave), are omitted. The optical techniques described use simple lamp or small laser sources and are thus, in principle, easily accessible. Epioptic probes can provide new information on solid-gas, solid-liquid and liquid-liquid interfaces. They are particularly suited to growth monitoring. Emerging process technologies for fabricating submicron and nanoscale semiconductor devices and novel multilayer materials, whether based on silicon or compound semiconductors, all require extremely precise control of growth at surfaces. In situ, non-destructive, real-time monitoring and characterisation of surfaces under growth conditions is needed for further progress. Both atomic scale resolution, and non-destructive characterisation of buried structures, are required.