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Author: G. McGuire Publisher: Springer Science & Business Media ISBN: 1475717024 Category : Science Languages : en Pages : 144
Book Description
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Author: G. McGuire Publisher: Springer Science & Business Media ISBN: 1475717024 Category : Science Languages : en Pages : 144
Book Description
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Author: Siegfried Hofmann Publisher: Springer Science & Business Media ISBN: 3642273807 Category : Science Languages : en Pages : 544
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: B. Vincent Crist Publisher: John Wiley & Sons ISBN: 0471492655 Category : Science Languages : de Pages : 562
Book Description
These three volumes provide comprehensive information about the instrument, the samples, and the methods used to collect the spectra. The spectra are presented on a landscape format and cover a wide variety of elements,polymers, semiconductors, and other materials. Offers a clear presentation of spectra with the rightamount of experimental detail. All of the experiments have been conducted under controlled conditions on the same instrument by aworld-renowned expert.
Author: John F. Watts Publisher: John Wiley & Sons ISBN: 1119417643 Category : Technology & Engineering Languages : en Pages : 320
Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author: Günter H. Zschornack Publisher: Springer Science & Business Media ISBN: 3540286187 Category : Technology & Engineering Languages : en Pages : 969
Book Description
This is the only handbook available on X-ray data. In a concise and informative manner, the most important data connected with the emission of characteristic X-ray lines are tabulated for all elements up to Z = 95 (Americium). The tabulated data are characterized and, in most cases, evaluated. Furthermore, all important processes and phenomena connected with the production, emission and detection of characteristic X-rays are discussed.
Author: Patrick Echlin Publisher: Springer Science & Business Media ISBN: 1475790279 Category : Medical Languages : en Pages : 463
Book Description
This book has its origins in the intensive short courses on scanning elec tron microscopy and x-ray microanalysis which have been taught annually at Lehigh University since 1972. In order to provide a textbook containing the materials presented in the original course, the lecturers collaborated to write the book Practical Scanning Electron Microscopy (PSEM), which was published by Plenum Press in 1975. The course con tinued to evolve and expand in the ensuing years, until the volume of material to be covered necessitated the development of separate intro ductory and advanced courses. In 1981 the lecturers undertook the project of rewriting the original textbook, producing the volume Scan ning Electron Microscopy and X-Ray Microanalysis (SEMXM). This vol ume contained substantial expansions of the treatment of such basic material as electron optics, image formation, energy-dispersive x-ray spectrometry, and qualitative and quantitative analysis. At the same time, a number of chapters, which had been included in the PSEM vol ume, including those on magnetic contrast and electron channeling con trast, had to be dropped for reasons of space. Moreover, these topics had naturally evolved into the basis of the advanced course. In addition, the evolution of the SEM and microanalysis fields had resulted in the devel opment of new topics, such as digital image processing, which by their nature became topics in the advanced course.
Author: J. C. Vickerman Publisher: IM Publications ISBN: 1906715173 Category : Mass spectrometry Languages : en Pages : 742
Book Description
Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is the most versatile of the surface analysis techniques that have been developed during the last 30 years. This is the Second Edition of the first book ToF-SIMS: Surface analysis by Mass Spectrometry to be dedicated to the subject and the treatment is comprehensive
Author: G. McGuire
Author: G. McGuire
Author: Siegfried Hofmann
Author: Kenton D. Childs
Author: B. Vincent Crist
Author: John F. Watts
Author: David Briggs
Author: Günter H. Zschornack
Author: Paul W. Palmberg
Author: Patrick Echlin
Author: J. C. Vickerman