Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 13
Book Description
Growth and Characterization of Tetrahedral Amorphous-carbon Films (ta-C) by Pulsed Laser Deposition
Author: Growth and Characterization of Low Stress Amorphous Carbon Films by Pulsed Laser Deposition Process
Author: Sang Hyun YoonTetrahedrally Bonded Amorphous Carbon Films I
Author: Bernd SchultrichPublisher: Springer
ISBN: 3662559277
Category : Technology & Engineering
Languages : en
Pages : 769
Book Description
This book presents the status quo of the structure, preparation, properties and applications of tetrahedrally bonded amorphous carbon (ta-C) films and compares them with related film systems. Tetrahedrally bonded amorphous carbon films (ta-C) combine some of the outstanding properties of diamond with the versatility of amorphous materials. The book compares experimental results with the predictions of theoretical analyses, condensing them to practicable rules. It is strictly application oriented, emphasizing the exceptional potential of ta-C for tribological coatings of tools and components.
Pulsed-Laser Deposited Amorphous Diamond and Related Materials: Synthesis, Characterization, and Field Emission Properties
Author: Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Amorphous carbon films with variable sp[sup 3] content were produced by ArF (193nm) pulsed laser deposition. An in-situ ion probe was used to measure kinetic energy of C[sup+] ions. In contrast to measurements made as a function of laser fluence, ion probe measurements of kinetic energy are a convenient as well as more accurate and fundamental method for monitoring deposition conditions, with the advantage of being readily transferable for inter-laboratory comparisons. Electron energy loss spectroscopy (EELS) and spectroscopic ellipsometry measurements reveal that tetrahedral amorphous carbon (ta-C) films with the most diamond-like properties are obtained at the C ion kinetic energy of[approximately]90 eV. Film properties are uniform within a 12-15[degree] angle from the plume centerline. Tapping-mode atomic force microscope measurements show that films deposited at near-optimum kinetic energy are extremely smooth, with rms roughness of only[approximately] 1[angstrom] over distances of several hundred nm. Field emission (FE) measurements show that ta-C does not appear to be a good electron emitter. After conditioning of ta-C films deposited on n-type Si a rather high turn-on voltage of[approximately]50 V/[micro]m was required to draw current of[approximately]1 nA to the probe. The emission was unstable and typically ceased after a few minutes of operation. The FE tests of ta-C and other materials strongly suggest that surface morphology plays a dominant role in the FE process, in agreement with conventional Fowler-Nordheim theory.
Characterization of Amorphous Carbon Films Grown by Pulsed-laser Deposition
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 12
Book Description
Amorphous carbon (a-C) films grow via energetic processes such as pulsed-laser deposition (PLD). The cold-cathode electron emission properties of a-C are promising for flat-panel display and vacuum microelectronics technologies. These ultrahard films consist of a mixture of 3-fold and 4-fold coordinated carbon atoms, resulting in an amorphous material with diamond-like properties. The authors study the structures of a-C films grown at room temperature as a function of PLD energetics using x-ray reflectivity, Raman spectroscopy, high-resolution transmission electron microscopy, and Rutherford backscattering spectrometry. While an understanding of the electron emission mechanism in a-C films remains elusive, the onset of emission is typically preceded by conditioning where the material is stressed by an applied electric field. To simulate conditioning and assess its effect, the authors use the spatially-localized field and current of a scanning tunneling microscope tip. Scanning force microscopy shows that conditioning alters surface morphology and electronic structure. Spatially-resolved electron energy loss spectroscopy indicates that the predominant bonding configuration changes from predominantly 4-fold to 3-fold coordination.
Sputtering Deposition and Characterization of Ultrathin Amorphous Carbon Films
Author: Wei LuStructural and Electrical Characterization of Highly-tetrahedral- Coordinated Diamond-like Carbon Films Grown by Pulsed-laser Deposition
Author: Schicksal und Glaube
Author: Cajus FabriciusProperties and Characterization of Amorphous Carbon Films
Author: J.J. PouchPublisher: Trans Tech Publications Ltd
ISBN: 3035704503
Category : Technology & Engineering
Languages : en
Pages : 714
Book Description
Amorphous, hydrogenated carbon (AHC) films can be deposited on various substrates using several techniques, e.g. plasma deposition and ion beam deposition. The resulting films can be hard, wear resistant and transparent.
Growth and Characterization of Diamond and Diamond Like Carbon Films with Interlayer
Author: Roja GottimukkalaPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
ABSTRACT: Diamond and diamond-like carbon films, with their exceptionally good mechanical, chemical, and optical properties, are the best materials as protective hard coatings for electronic devices and cutting tools. The biocompatibility of these materials makes it suitable for bone implants. The wide range applications of these films are hindered because of the high compressive stresses developed during the deposition. Use of carbide and nitride interfacial layers has emerged as one of the methods to reduce the compressive stresses. The present research focuses on the study of different materials as the interfacial layers for diamond and tetrahedral amorphous carbon films. For tetrahedral amorphous carbon AlN, Ta, TiN, TiC, TaN and W were investigated as the interlayer materials. The interlayer was deposited at different substrate temperatures to study the temperature induced changes in the residual stress. The tetrahedral amorphous carbon with TiN interlayer deposited at 300°C and 600°C exhibited a maximum reduction in the stress. TiN and TiC were deposited as interlayer for the diamond films on Ti-6Al-4V alloy. TiC has improved the adhesion of diamond with the substrate and exhibited less compressive stresses compared to TiN.