Author: Rajat Roychoudhury Publisher: ISBN: Category : Diamond thin films Languages : en Pages : 126
Book Description
Diamond is one of the most technologically and scientifically valuable crystalline solids due to its extraordinary thermal, mechanical, optical, chemical and radiation resistant properties. This uniqueness makes diamond materials of great interest in the field of microelectronics. However, progress in this area has been limited because of difficulties associated with doping, uniformity of polycrystalline films, patterning and inconsistency in reproducibility. For application in electronics, both p- and n-type doping of diamond films must be realized. Both natural and synthetic p-type diamond exists, and boron doping of diamond films (for p-type conductivity) is readily obtainable during chemical vapor deposition. Devices such as field effect transistors and Schottky diodes have been fabricated from such films. However, the development of diamond-based electronic devices has been hindered by the inability to produce reasonably conductive n-type diamond. In this study, we have investigated in situ phosphorus doping of diamond films to obtain n-type conducting diamond films. The diamond films were obtained through hot-filament chemical vapor deposition. The films were identified as good quality polycrystalline diamond through X-ray diffraction, scanning electron microscopy and Raman spectroscopy. The n-type dopant incorporation was established through Secondary Ion Mass Spectroscopy. Both lightly doped (resistive) and heavily doped (well conducting) n-type diamond films were obtained, and their electrical properties were established through Current-Voltage characteristics. The diamond interface characteristics with silicon substrate and metal contacts were studied through Voltage Contrast and Electron Beam Induced Current techniques. Devices such as Schottky diodes were fabricated from these phosphorus doped diamond films. These diamond films were found to be reproducible and their electrical characteristics repeatable, thus, setting a trend towards solving one of the main problems in realizing diamond as a material for the future in the semiconductor industry.
Author: Sattar Mirzakuchaki Publisher: ISBN: Category : Diamond thin films Languages : en Pages : 272
Book Description
Chemical vapor deposited (CVD) diamond thin films grown homoepitaxially as well as on non-diamond substrates have been the subject of intense investigation since the beginning of the last decade. Diamond's remarkable properties such as physical hardness, chemical inertness, high thermal conductivity, high breakdown voltage, and high carrier mobility are the main factors for the attention it has received from many researchers around the world. Although these properties are somewhat degraded in polycrystalline diamond films, they are still superior to many other materials. One of the most potentially useful applications of diamond thin films is in the semiconductor industry. Although a few prototype devices such as field effect transistors and Schottky diodes have been fabricated on diamond, some major obstacles remain to be overcome before full scale commercial applications of diamond as a semiconductor is possible. The high cost of large area monocrystalline diamond substrates has forced researchers to look for alternative substrates for the heteroepitaxial growth of diamond. So far only marginal results have been reported on the growth of highly oriented diamond films and on the heteroepitaxial growth involving substrates that are as costly as diamond. Silicon, as the dominant material in semiconductor industry, has been the subject of much research as a substrate for the growth of polycrystalline diamond. Another problem in development of diamond as a semiconductor is the effective doping of diamond, particularly for n-type conductivity. Although many researchers have studied boron-doped (p-type) diamond thin films in the past several years, there have been few reports on the effects of doping diamond films with phosphorous (n-type). Once these two issues have been solved, other fabrication steps such as oxidation, etching, masking, etc. may be attempted. The present work is a study directed toward solving some of these problems by looking at in-situ doping of n-type hot filament CVD (HFCVD) grown diamond films on silicon substrates. The study includes electrical characterization, stable metallic contacts, effect of silicon substrate surface pretreatment, and selective area deposition. A number of different techniques for inducing diamond nucleation on Si substrates are studied and the resulting diamond films characterized by common techniques such as Raman spectroscopy, X-ray diffraction, optical and scanning electron microscopy, and profilometery. The effect of doping the diamond films with different concentrations of phosphorous as well as calculation of the activation energy by temperature measurement was also carried out in this work. A new technique is presented for the selective deposition of diamond films onto silicon substrates.
Author: Christopher Nebel Publisher: Academic Press ISBN: 0080541038 Category : Technology & Engineering Languages : en Pages : 481
Book Description
This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices. · Accessible by both experts and non-experts in the field of semi-conductors research and technology, each chapter is written in a tutorial format· Helping engineers to manufacture devices with optimized electronic properties· Truly international, this volume contains chapters written by recognized experts representing academic and industrial institutions from Europe, Japan and the US
Author: Jay Lee Publisher: Springer Science & Business Media ISBN: 1402034717 Category : Technology & Engineering Languages : en Pages : 469
Book Description
Modern industry imposes ever increasing requirements upon tools and tool materials as to the provision for performance under the conditions of high cutting speeds and dynamic loads as well as under intensive thermal and chemical interactions with workpiece materials. The industry demands a higher productivity in combination with the accuracy of geometry and dimensions of workpieces and quality of working surfaces of the machined pieces. These requirements are best met by the tool superhard materials (diamond and diamond-like cubic boron nitride). Ceramics based on silicon carbide, aluminum and boron oxides as well as on titanium, silicon and aluminum nitrides offer promise as tool materials. Tungsten-containing cemented carbides are still considered as suitable tool materials. Hi- hardness and high strength composites based on the above materials fit all the requirements imposed by machining jobs when manufacturing elements of machinery, in particular those operating under the extreme conditions of high temperatures and loads. These elements are produced of difficult-- machine high-alloy steels, nickel refractory alloys, high-tech ceramics, materials with metallic and non-metallic coatings having improved wear resistance, as well as of special polymeric and glass-ceramic materials. Materials science at high pressure deals with the use of high-pressure techniques for the development and production of unique materials whose preparation at ambient pressure is impossible (e. g. , diamond, cubic boron nitride, etc. ) or of materials with properties exceeding those of materials produced at ambient pressure (e. g. , high-temperature superconductors).
Author: Dieter M. Gruen Publisher: Springer Science & Business Media ISBN: 1402033222 Category : Science Languages : en Pages : 410
Book Description
We are pleased to present the Proceedings of the NATO Advanced Research Workshop “Syntheses, Properties and Applications of Ultrananocrystalline Diamond” which was held June 7-10, 2004 in St. Petersburg, Russia. The main goal of the Workshop was to provide a forum for the intensive exchange of opinions between scientists from Russia and NATO countries in order to give additional impetus to the development of the science and applications of a new carbon nanostructure, called ultrananocrystalline diamond (UNCD) composed of 2-5 nm crystallites. There are two forms of UNCD, dispersed particles and films. The two communities of researchers working on these two forms of UNCD have hitherto lacked a common forum in which to explore areas of scientific and technological overlap. As a consequence, the two fields have up to now developed independently of each other. The time had clearly come to remedy this situation in order to be able to take full advantage of the enormous potential for societal benefits to be derived from exploiting the synergistic relationships between UNCD dispersed particulates and UNCD films. The NATO sponsored ARW therefore occurred in a very timely manner and was successful in beginning the desired dialogue, a precondition for making progress toward the above stated goal. The discovery of UNCD completes a triadof nanostructured carbonswhich includes fullerenes and nanotubes.
Author: Orlando Auciello Publisher: Cambridge University Press ISBN: 1107088739 Category : Technology & Engineering Languages : en Pages : 297
Book Description
A comprehensive guide to ultrananocrystalline-diamond (UNCDTM) and thin film technology for implantable and external medical devices, edited by a pioneer in the field. Covering synthesis and properties, clinical applications, and regulation, it is essential reading for researchers and practitioners in materials science and biomedical engineering.
Author: Publisher: Academic Press ISBN: 0128202416 Category : Science Languages : en Pages : 318
Book Description
Diamond for Quantum Applications Part 1, Volume 103, the latest release in the Semiconductors and Semimetals series, highlights new advances in the field, with this new volume presenting interesting chapters on a variety of timely topics. Each chapter is written by an international board of authors. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Semiconductors and Semimetals series Updated release includes the latest information on the use of diamonds for quantum applications
Author: Rajat Roychoudhury
Author: Sattar Mirzakuchaki
Author: Christopher Nebel
Author: 
Author: Jay Lee
Author: Dieter M. Gruen
Author: Orlando Auciello
Author: Oliver Williams
Author: Yijian Jin
Author: