Author: Matthew Alan Ring
Publisher:
ISBN:
Category :
Languages : en
Pages : 94
Book Description
Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique
Author: Matthew Alan Ring
Publisher:
ISBN:
Category :
Languages : en
Pages : 94
Book Description
Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Publisher:
ISBN:
Category :
Languages : en
Pages : 94
Book Description
Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Master's Theses Directories
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 356
Book Description
"Education, arts and social sciences, natural and technical sciences in the United States and Canada".
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 356
Book Description
"Education, arts and social sciences, natural and technical sciences in the United States and Canada".
Structural Integrity Considerations In. .
Author: Hoeppner
Publisher: World Scientific
ISBN: 1860949509
Category : Technology & Engineering
Languages : en
Pages : 628
Book Description
This book deals with the concepts of structural integrity from safe life to damage tolerance to holistic structural integrity processes, which are all part of a reliability-centered closed loop design approach. Volume 1 introduces the concepts of structural integrity and the basics of fatigue design, including the development of safe life fatigue design concepts based on traditional continuum mechanics. An extensive discussion of discontinuities is presented to illustrate their importance to all deformation mechanisms and especially the mechanisms of fatigue. The historical aspects of fatigue design are also introduced with emphasis on the stress-life and strain-life approaches, along with the many factors that affect fatigue life of structures and their utilization in society. Latter chapters of the book briefly discuss the extraneous effects on fatigue such as corrosion, fretting, wear, creep, and accidental damage. These will be dealt with in more detail in latter volumes. Finally, the book gives many examples of fatigue failures that have occurred in history and cites ways these could have been prevented and the lessons learned from such fatigue failures.
Publisher: World Scientific
ISBN: 1860949509
Category : Technology & Engineering
Languages : en
Pages : 628
Book Description
This book deals with the concepts of structural integrity from safe life to damage tolerance to holistic structural integrity processes, which are all part of a reliability-centered closed loop design approach. Volume 1 introduces the concepts of structural integrity and the basics of fatigue design, including the development of safe life fatigue design concepts based on traditional continuum mechanics. An extensive discussion of discontinuities is presented to illustrate their importance to all deformation mechanisms and especially the mechanisms of fatigue. The historical aspects of fatigue design are also introduced with emphasis on the stress-life and strain-life approaches, along with the many factors that affect fatigue life of structures and their utilization in society. Latter chapters of the book briefly discuss the extraneous effects on fatigue such as corrosion, fretting, wear, creep, and accidental damage. These will be dealt with in more detail in latter volumes. Finally, the book gives many examples of fatigue failures that have occurred in history and cites ways these could have been prevented and the lessons learned from such fatigue failures.
JJAP
Japanese Journal of Applied Physics
Nanocomposite Thin Films and Coatings
Author: Sam Zhang
Publisher: Imperial College Press
ISBN: 1860949975
Category : Science
Languages : en
Pages : 628
Book Description
Materials development has reached a point where it is difficult for a single material to satisfy the needs of sophisticated applications in the modern world. Nanocomposite films and coatings achieve much more than the simple addition of the constitutents OCo the law of summation fails to work in the nano-world. This book encompasses three major parts of the development of nanocomposite films and coatings: the first focuses on processing and properties, the second concentrates on mechanical performance, and the third deals with functional performance, including wide application areas ranging from mechanical cutting to solar energy and from electronics to medicine. Sample Chapter(s). Chapter 1: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings With Case Studies: Nanocrystalline Tin Embedded in Amorphous SiNx (187 KB). Contents: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiN Embedded in Amorphous SiN x (S Zhang et al.); Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiC Embedded in Amorphous Carbon (S Zhang et al.); Properties of Chemical Vapor Deposited Nanocrystalline Diamond and Nanodiamond/Amorphous Carbon Composite Films (S C Tjong); Synthesis, Characterization and Applications of Nanocrystalline Diamond Films (Z-Q Xu & A Kumar); Properties of Hard Nanocomposite Thin Films (J Musil); Nanostructured, Multifunctional Tribological Coatings (J J Moore et al.); Nanocomposite Thin Films for Solar Energy Conversion (Y-B Yin); Application of Silicon Nanocrystal in Non-Volatile Memory Devices (T P Chen); Nanocrystalline Silicon Films for Thin Film Transistor and Optoelectronic Applications (Y-J Choi et al.); Amorphous and Nanocomposite Diamond-Like Carbon Coatings for Biomedical Applications (T I T Okpalugo et al.); Nanocoatings for Orthopaedic and Dental Application (W-Q Yan). Readership: Undergraduates, postgraduates, researchers, scientists, college and university professors, research professionals, technology investors and developers, research enterprises, R&D research laboratories, academic and research libraries."
Publisher: Imperial College Press
ISBN: 1860949975
Category : Science
Languages : en
Pages : 628
Book Description
Materials development has reached a point where it is difficult for a single material to satisfy the needs of sophisticated applications in the modern world. Nanocomposite films and coatings achieve much more than the simple addition of the constitutents OCo the law of summation fails to work in the nano-world. This book encompasses three major parts of the development of nanocomposite films and coatings: the first focuses on processing and properties, the second concentrates on mechanical performance, and the third deals with functional performance, including wide application areas ranging from mechanical cutting to solar energy and from electronics to medicine. Sample Chapter(s). Chapter 1: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings With Case Studies: Nanocrystalline Tin Embedded in Amorphous SiNx (187 KB). Contents: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiN Embedded in Amorphous SiN x (S Zhang et al.); Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiC Embedded in Amorphous Carbon (S Zhang et al.); Properties of Chemical Vapor Deposited Nanocrystalline Diamond and Nanodiamond/Amorphous Carbon Composite Films (S C Tjong); Synthesis, Characterization and Applications of Nanocrystalline Diamond Films (Z-Q Xu & A Kumar); Properties of Hard Nanocomposite Thin Films (J Musil); Nanostructured, Multifunctional Tribological Coatings (J J Moore et al.); Nanocomposite Thin Films for Solar Energy Conversion (Y-B Yin); Application of Silicon Nanocrystal in Non-Volatile Memory Devices (T P Chen); Nanocrystalline Silicon Films for Thin Film Transistor and Optoelectronic Applications (Y-J Choi et al.); Amorphous and Nanocomposite Diamond-Like Carbon Coatings for Biomedical Applications (T I T Okpalugo et al.); Nanocoatings for Orthopaedic and Dental Application (W-Q Yan). Readership: Undergraduates, postgraduates, researchers, scientists, college and university professors, research professionals, technology investors and developers, research enterprises, R&D research laboratories, academic and research libraries."
Amorphous Silicon Technology - 1991: Volume 219
Author: ARUN Madan
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 920
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 920
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Amorphous Silicon Technology
Author:
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 946
Book Description
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 946
Book Description
Electrical & Electronics Abstracts
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
Book Description
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
Book Description