Author: Triveni SrinivasanPublisher:
ISBN:
Category :
Languages : en
Pages : 218
Book Description
Generation of Coherent, Vacuum Ultraviolet and Extreme Ultraviolet Radiation
Author: Triveni SrinivasanGeneration of Coherent Vacuum
Author: Hans HallstadiusGeneration of Coherent Vacuum Ultraviolet Radiation
Author: Andrew Hing-Cheong KungPublisher:
ISBN:
Category : Lasers
Languages : en
Pages : 82
Book Description
Generation of Coherent Extreme Ultraviolet Radiation
Author: Kwei-Sun HsuPublisher:
ISBN:
Category : Laser beams
Languages : en
Pages : 192
Book Description
Generation of Coherent and Incoherent Vacuum Ultraviolet Radiation
Author: Ludwik Jerzy ZychPublisher:
ISBN:
Category : Ultraviolet radiation
Languages : en
Pages : 164
Book Description
Generation of Tunable Coherent Vacuum Ultraviolet Radiation
Author: George A. ZdasiukCoherent Extreme Ultraviolet Generation and Surface Studies Using Ultraviolet Excimer Lasers
Author: Charles K. RhodesPublisher:
ISBN:
Category :
Languages : en
Pages : 129
Book Description
The goal of this research program is the development of coherent X-ray sources is the kilovolt range. An initial application of short wavelength radiation in the vacuum ultraviolet region for photoemission studies of GaHz surfaces has been performed demonstrating the feasibility of this class of experiments. A basic and long-standing problem in the field of coherent sources is that associated with the generation of coherent energy in the extreme ultraviolet and soft x-ray regions. During the last three years, picosecond rare gas halogen (RGH) excimert laser technology, on account of the very favorable scaling relationships governing the spectral brightness of these sources, has emerged as a key factor in new techniques useful for generation of coherent radiation below 100 nm. The operation of RGH systems will be extended down into the femtosecond region, a development that will enable sources with peak powers P in the 1TW
Generation and Application of Coherent Extreme Ultraviolet Radiation
Author: Hoang Vu LePublisher: LAP Lambert Academic Publishing
ISBN: 9783659749360
Category :
Languages : en
Pages : 136
Book Description
High harmonic generation featuring ultra-short pulses, short wavelengths and highly coherent radiation in a table-top setup has become one of the most versatile and affordable tools for studies of atomic and molecular dynamics as well as for nano-scale coherent diffractive imaging. In this book, we show the background and technical aspects of the generation and enhancement of high order harmonic radiations down to the water window region (2.3 - 4.4 nm). The source is specifically tailored and developed for imaging applications. By controlling and stabilizing the phase-matching condition in a gas cell, an extreme ultra-violet source which satisfies these requirements has been generated. Using a harmonic source with wavelengths around 30 nm, a resolution of 45 nm for a micrometer-size transmission sample has been obtained and biological-like absorption samples are also successfully reconstructed. A phase retrieval algorithm with a phase-curvature correction is developed to take advantage of the higher photon flux when placing the sample near the focus point.
Ultraviolet Spectroscopy And Uv Lasers
Author: Prabhakar MisraPublisher: CRC Press
ISBN: 0824744063
Category : Science
Languages : en
Pages : 572
Book Description
This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and atmospheric science.
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.