Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 199
Book Description
Generation and Use of Radiation in the Extreme Ultraviolet and Soft X-ray Region
Author: Special Issue on Generation and Use of Radiation in the Extreme Ultraviolet and Soft X-ray Region
Author: X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher: Cambridge University Press
ISBN: 1316810666
Category : Technology & Engineering
Languages : en
Pages :
Book Description
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.
Radiation characteristics of extreme UV and soft X-ray sources
Author: Tobias MeyPublisher: Göttingen University Press
ISBN: 3863952111
Category :
Languages : en
Pages : 154
Book Description
Electromagnetic radiation in the extreme UV and soft x-ray spectral range is of steadily increasing importance in fundamental research and industrial applications. An optimum use of the available photons can only be achieved under condition of a comprehensive beam characterization. Following that goal, this work addresses the pathway of extreme UV and soft x-ray radiation from its generation, through the beam transport by the beamline to the probe position. Experimentally, those aspects are optimized at a laser-produced plasma source and at an arrangement for the generation of high-harmonics. Additionally, the coherence of laser beams is analyzed by measurements of the Wigner distribution function. This method is applied to the photon beam of the free-electron laser FLASH, resulting in the entire characterization of its propagation properties.
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Soft x-rays and extreme ultraviolet radiation
Author: David AttwoodPublisher:
ISBN: 9781139641326
Category :
Languages : en
Pages : 470
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
Coherent Sources of XUV Radiation
Author: Pierre JaegléPublisher: Springer
ISBN: 0387299904
Category : Science
Languages : en
Pages : 414
Book Description
Extreme ultraviolet radiation, also referred to as soft X-rays or XUV, offers very special optical properties. The X-UV refractive index of matter is such that normal reflection cannot take place on polished surfaces whereas beam transmission through one micrometer of almost all materials reduces to zero. Therefore, it has long been a difficult task to imagine and to implement devices designed for complex optics experiments in this wavelength range. Thanks to new sources of coherent radiation - XUV-lasers and High Order Harmonics - the use of XUV radiation, for interferometry, holography, diffractive optics, non-linear radiation-matter interaction, time-resolved study of fast and ultrafast phenomena and many other applications, including medical sciences, is ubiquitous.
Soft X-rays and Extreme Ultraviolet Radiation
Author: David Attwood (University of California, Berkeley.)Publisher:
ISBN: 9781139636421
Category :
Languages : en
Pages :
Book Description
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher:
ISBN: 9781316085097
Category : Grenz rays
Languages : en
Pages : 488
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
Enhancement Cavities for the Generation of Extreme Ultraviolet and Hard X-Ray Radiation
Author: Henning CarstensPublisher: Springer
ISBN: 3319940090
Category : Science
Languages : en
Pages : 103
Book Description
This thesis discusses the power scaling of ultrashort pulses in enhancement cavities, utilized in particular for frequency conversion processes, such as Thomson scattering and high-harmonic generation. Using custom optics for ultrashort-pulse enhancement cavities, it demonstrates for the first time that at the envisaged power levels, the mitigation of thermal effects becomes indispensable even in cavities comprising solely reflective optics. It also studies cavities with large beams, albeit with low misalignment sensitivity, as a way to circumvent intensity-induced mirror damage. Average powers of several hundred kilowatts are demonstrated, which benefit hard x-ray sources based on Thomson scattering. Furthermore, pulses as short as 30 fs were obtained at more than 10 kW of average power and employed for high-harmonic generation with photon energies exceeding 100 eV at 250 MHz repetition rate, paving the way for frequency comb spectroscopy in this spectral region.