Generation and Characterization of an Ionized Fullerene Beam and Its Application to the Ion-assisted Deposition of Thin Films PDF Download

Author: Paul David Horak
Publisher:
ISBN:
Category : Fullerenes
Languages : en
Pages : 178

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Author: A. R. González-Elipe
Publisher: World Scientific Publishing Company
ISBN: 9781860943515
Category : Science
Languages : en
Pages : 283

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Book Description
An introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. Addressed to researchers, post-graduates and even engineers with little or no experience, the book reviews the basic concepts related to the interaction of low energy ion beams with materials.

Author: T. Itoh
Publisher: Elsevier
ISBN: 0444599088
Category : Science
Languages : en
Pages : 458

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Book Description
This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.

Author: Philipp Schumacher
Publisher:
ISBN:
Category :
Languages : de
Pages :

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Book Description

Author: Jerome J. Cuomo
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464

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Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.

Author: P.L.F. Hemment
Publisher: Newnes
ISBN: 0444596313
Category : Technology & Engineering
Languages : en
Pages : 630

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Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 68

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Author: H. A. Atwater
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 472

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Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10

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Book Description
This article, using TiO2 thin films as examples, studied and analyzed the optical properties, laser damage threshold values, and microstructures of thin films associated with ion assisted sedimentation at different energies. jg.

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 27

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Book Description
Ion beam-surface interactions produce many effects in thin film deposition which are similar to those encountered in plasma deposition processes. However, because of the lower pressures and higher directionality associated with the ion beam process, it is easier to avoid some sources of film contamination and to provide better control of ion energies and fluxes. Additional effects occur in the ion beam process because of the relatively small degree of thermalization resulting from gas phase collisions with both the ion beam and atoms sputtered from the target. These effects may be either beneficial or detrimental to the film properties, depending on the material and deposition conditions. Ion beam deposition is particularly suited to the deposition of multi-component films and layered structures, and can in principle be extended to a complete device fabrication process. However, complex phenomena occur in the deposition of many materials of high technical interest which make it desirable to monitor the film growth at the monolayer level. It is possible to make use of ion-surface interactions to provide a full suite of surface analytical capabilities in one instrument, and this data may be obtained at ambient pressures which are far too high for conventional surface analysis techniques. Such an instrument is under development and its current performance characteristics and anticipated capabilities are described.