Author: Michael J. AzizPublisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 806
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Fundamentals of Beam-Solid Interactions and Transient Thermal Processing: Volume 100
Author: Michael J. AzizPublisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 806
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Rapid Thermal Processing
Author: Richard B. FairPublisher: Academic Press
ISBN: 0323139809
Category : Technology & Engineering
Languages : en
Pages : 441
Book Description
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Reduced Thermal Processing for ULSI
Author: R.A. LevyPublisher: Springer Science & Business Media
ISBN: 1461305411
Category : Science
Languages : en
Pages : 444
Book Description
As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics.
Phase Formation and Modification by Beam-Solid Interactions: Volume 235
Author: Gary S. WasPublisher:
ISBN:
Category : Science
Languages : en
Pages : 952
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publications of Los Alamos Research
Author: Los Alamos National LaboratoryPublisher:
ISBN:
Category : Research
Languages : en
Pages : 276
Book Description
Energy Research Abstracts
Author: Scientific and Technical Aerospace Reports
Author: Time-resolved Diffraction
Author: J. R HelliwellPublisher: Oxford University Press
ISBN: 9780198500322
Category : Science
Languages : en
Pages : 446
Book Description
Recent technological advances in synchrotron and neutron sources, detectors, and computer hardware and software have made possible diffraction techniques which collect data at successive moments in time. This is the first book to bring together reviews and research articles covering the three branches of time-resolved diffraction--X-ray, electron, and neutron field. Time-Resolved Diffraction covers gases, liquids, amorphous solids, fibers, and crystals and does so in a multidisciplinary framework which includes examples from molecular biology and chemistry, as well as techniques from physics and materials science. The various time scales of data collection cover ten orders of magnitude, from the sub-pico domain to the kilosecond. Research scientists and graduate students will find this book the most complete compendium of work in this developing field.
Deep Implants: Fundamentals and Applications
Author: G.G. BentiniPublisher: Elsevier
ISBN: 0444596372
Category : Science
Languages : en
Pages : 292
Book Description
Deep implants are produced by the high-energy implantation of impurities in a host material. The thus created subsurface layers have properties that are different from the very surface and the bulk and show great promise for application in the electronics industry.
Photon, Beam and Plasma Assisted Processing
Author: E.F. KrimmelPublisher: Elsevier
ISBN: 0444596364
Category : Technology & Engineering
Languages : en
Pages : 744
Book Description
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.